Hostname: page-component-77c89778f8-m8s7h Total loading time: 0 Render date: 2024-07-17T04:51:50.082Z Has data issue: false hasContentIssue false
  • English
  • Français

In Situ STEM of Ag and Cu Conducting Bridge Formation through Al2O3 in Nanoscale Resistive Memory Devices

Published online by Cambridge University Press:  27 August 2014

William A. Hubbard ,
E. R. White ,
Alexander Kerelsky ,
Jared J. Lodico  and
B. C. Regan
William A. Hubbard
Affiliation:
1Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, California 90095USA
E. R. White
Affiliation:
1Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, California 90095USA
Alexander Kerelsky
Affiliation:
1Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, California 90095USA
Jared J. Lodico
Affiliation:
1Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, California 90095USA
B. C. Regan
Affiliation:
1Department of Physics & Astronomy and California NanoSystems Institute, University of California, Los Angeles, California 90095USA

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 1550 - 1551
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Yang, J., et al, Nature Nanotechnology 8 (2013), 13-24.Google Scholar
[2] Rahaman, S, et al, Nanoscale Research Letters 7 (2012) 345.Google Scholar
[3] Valov, I., et al, Nature Communications 4 (2013) 1771.Google Scholar
[4] This work is supported by STARnet, a Semiconductor Research Corporation program sponsored by MARCO and DARPA, NSF DMR award 1206849, and the Electron Imaging Center for NanoMachines at the UCLA CNSI.Google Scholar