Hostname: page-component-77c89778f8-n9wrp Total loading time: 0 Render date: 2024-07-19T04:35:59.681Z Has data issue: false hasContentIssue false
  • English
  • Français

High-Resolution Secondary Electron Imaging of a FIB Prepared Si Sample with an Aberration Corrected Electron Microscope

Published online by Cambridge University Press:  01 August 2010

M Konno ,
Y Suzuki ,
H Inada ,
K Nakamura ,
K Kimoto  and
Y Zhu
M Konno
Affiliation:
Hitachi High-Technologies, Japan
Y Suzuki
Affiliation:
Hitachi High-Technologies, Japan
H Inada
Affiliation:
Hitachi High-Technologies, Japan
K Nakamura
Affiliation:
Hitachi High-Technologies, Japan
K Kimoto
Affiliation:
National Institute of Material Science, Japan
Y Zhu
Affiliation:
Brookhaven National Laboratory

Extract

Core share and HTML view are not available for this content. However, as you have access to this content, a full PDF is available via the ‘Save PDF’ action button.

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 128 - 129
Copyright
Copyright © Microscopy Society of America 2010