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Four-Dimensional Dielectric Property Imaging of Low-K Materials for Copper Metallization Using Electron Spectroscopic Imaging Series

Published online by Cambridge University Press:  02 July 2020

S.C. Lo
Affiliation:
Department of Engineering and System Science, National Tsing-Hua University, Hsinchu, Taiwan 300, Republic of China
F.-R. Chen
Affiliation:
Department of Engineering and System Science, National Tsing-Hua University, Hsinchu, Taiwan 300, Republic of China
J.J. Kai
Affiliation:
Department of Engineering and System Science, National Tsing-Hua University, Hsinchu, Taiwan 300, Republic of China
L. Chang
Affiliation:
Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu, Taiwan, 300, Republic of China
Peijun Ding
Affiliation:
Applied Materials, Santa Clara, California, 95054, USA
Barry Chin
Affiliation:
Applied Materials, Santa Clara, California, 95054, USA
Fusen Chen
Affiliation:
Applied Materials, Santa Clara, California, 95054, USA
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Abstract

EFTEM has become a very useful tool in characterizing material properties, because it allows studying local chemical and electronic properties of a specimen with nanometer level spatial resolution. There are two spectroscopic imaging methods have been established to obtain both the spatial and the spectra information, I (x, y, ΔE), which can be quantitatively evaluated. One technique, as known as spectrum-image method, is based on scanning the electron beam across the sample to acquire the EELS spectrum with two-dimensional information. Conversely, the other method retrieves the spectra in a specific position from a series of energy loss images, as known as imaging-spectrum method. The spectrum-image method can be achieved with better energy resolution, however, a long acquisition time. Compared to spectrum-image method, which acquires a series of spectrum with scanning probe, the advantage of imaging-spectrum method is the capability of simultaneously recording abundant information in a series of maps.

Type
EELS Microanalysis at High Sensitivity: Advances in Spectrum Imaging, Energy Filtering and Detection (Organized by R. Leapman and J. Bruley)
Copyright
Copyright © Microscopy Society of America 2001

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