Focused Ion Beam as a Direct-write Mask Tool for Patterning Diamond

W McKenzie; J Pethica; G Cross

doi:10.1017/S1431927609096962

Focused Ion Beam as a Direct-write Mask Tool for Patterning Diamond

Published online by Cambridge University Press: 26 July 2009

W McKenzie ,

J Pethica and

G Cross

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W McKenzie: Affiliation:
Trinity College,Ireland
J Pethica: Affiliation:
Trinity College,Ireland
G Cross: Affiliation:
Trinity College,Ireland

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Extended abstract of a paper presented at Microscopy and Microanalysis 2009 in Richmond, Virginia, USA, July 26 – July 30, 2009

Type: Abstract
Information: Microscopy and Microanalysis , Volume 15 , Supplement S2 , July 2009 , pp. 328 - 329

DOI: https://doi.org/10.1017/S1431927609096962 [Opens in a new window]

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Focused Ion Beam as a Direct-write Mask Tool for Patterning Diamond

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