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Focused Helium Ion Beam Nanomachining of Thin Membranes vs. Bulk Substrates

Published online by Cambridge University Press:  27 August 2014

E.M. Mutunga ,
S. Lockerman ,
S. Tan ,
R. Livengood ,
A.E. Vladár  and
K.L. Klein
E.M. Mutunga
Affiliation:
University of the District of Columbia, 4200 Connecticut Ave NW, Washington, DC 20008
S. Lockerman
Affiliation:
University of the District of Columbia, 4200 Connecticut Ave NW, Washington, DC 20008
S. Tan
Affiliation:
Intel Corporation, Santa Clara, CA, 95054
R. Livengood
Affiliation:
Intel Corporation, Santa Clara, CA, 95054
A.E. Vladár
Affiliation:
National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899
K.L. Klein
Affiliation:
University of the District of Columbia, 4200 Connecticut Ave NW, Washington, DC 20008 National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 336 - 337
Copyright
Copyright © Microscopy Society of America 2014 

References

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