Hostname: page-component-848d4c4894-tn8tq Total loading time: 0 Render date: 2024-06-23T12:29:28.285Z Has data issue: false hasContentIssue false
  • English
  • Français

Fabrication of Ge On Insulator By Ion-Implantation And Dry Oxidation Techniques

Published online by Cambridge University Press:  23 November 2012

T. Kim ,
D.J. Llewellyn ,
K. Belay ,
R. Elliman ,
D. Choi  and
B. Luther-Davies
T. Kim
Affiliation:
Centre for Advanced Microscopy, Australian National University, Canberra, Australian Capital Territory, Australia
D.J. Llewellyn
Affiliation:
Centre for Advanced Microscopy, Australian National University, Canberra, Australian Capital Territory, Australia
K. Belay
Affiliation:
Centre for Advanced Microscopy, Australian National University, Canberra, Australian Capital Territory, Australia
R. Elliman
Affiliation:
Centre for Advanced Microscopy, Australian National University, Canberra, Australian Capital Territory, Australia
D. Choi
Affiliation:
Centre for Advanced Microscopy, Australian National University, Canberra, Australian Capital Territory, Australia
B. Luther-Davies
Affiliation:
Centre for Advanced Microscopy, Australian National University, Canberra, Australian Capital Territory, Australia
Get access

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Information
Microscopy and Microanalysis , Volume 18 , Issue S2: Proceedings of Microscopy & Microanalysis 2012 , July 2012 , pp. 1634 - 1635
Copyright
Copyright © Microscopy Society of America 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)