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Evaluation of Gallium Ion\Xe Plasma Beam for Patterning of Suspended Silicon Nitride Membranes

Published online by Cambridge University Press:  30 July 2021

Shuai Jiang ,
Tugba Isik ,
Ceren Yilmaz Akkaya ,
Suman Kumari  and
Volkan Ortalan
Shuai Jiang
Affiliation:
Department of Materials Science and Engineering, University of Connecticut, United States
Tugba Isik
Affiliation:
School of Mechanical Engineering, Purdue University, United States
Ceren Yilmaz Akkaya
Affiliation:
Department of Materials Science and Engineering, University of Connecticut, Storrs, Connecticut, United States
Suman Kumari
Affiliation:
Department of Materials Science and Engineering, University of Connecticut, United States
Volkan Ortalan
Affiliation:
Department of Materials Science and Engineering, University of Connecticut, United States

Abstract

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Type
Advances in Focused Ion Beam Instrumentation, Applications and Techniques in and Materials and Life Sciences
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 438 - 439
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Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

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