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Estimation of Electron Beam Broadening in Specimen for Analytical Electron Microscopy

Published online by Cambridge University Press:  02 July 2020

C.-W. Lee
Affiliation:
institute for Advanced Materials Processing, Tohoku University, Sendai, 980-8577, Japan.
S. Kidu
Affiliation:
institute for Advanced Materials Processing, Tohoku University, Sendai, 980-8577, Japan.
T. Oikawa
Affiliation:
JEOL Ltd., Tokyo, 190-0012, Japan.
D. Shindo
Affiliation:
institute for Advanced Materials Processing, Tohoku University, Sendai, 980-8577, Japan.
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Abstract

The electron beam broadening in specimens is a important issue to obtain a high spatial resolution expected by using a fine electron probe of nanometer order in analytical electron microscopy. Beam broadening mainly depends on electron diffusion in specimens. The theoretical equation on the beam broadening, which is based on single scattering approximation model for incident electrons, has been proposed by Goldstein et al.. in this work, the beam broadening was estimated experimentally by a TEM equipped with a field emission gun and the results were compared with the values theoretically obtained.

The sizes of the beam diameter with and without specimens were measured by using JEM-2010F and JEM 3000F TEMs, which are equipped with a field emission gun, being operated at 200 and 300 kV, respectively. The beam diameter was defined as the diameter containing 90% of the total electrons. The specimens used were amorphous SiO2, crystalline MgO and Si.

Type
Quantitative STEM: Imaging and EELS Analysis Honoring the Contributions of John Silcox (Organized by P. Batson, C. Chen and D. Muller)
Copyright
Copyright © Microscopy Society of America 2001

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References

references

1)Joy, D. C.et al., Principles of Analytical Electron Microscopy, Plenum Press, New York, (1986) 9.CrossRefGoogle Scholar
2)Goldstein, J. I.et al., Proc. 10th Annl. SEM Symp., ed by Johari, O., SEM Inc., Chicago, Vol. 1, (1977)315.Google Scholar