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Energy Filtered STEM Imaging at 30kV and Below - A New Window into the Nano-World?

Published online by Cambridge University Press:  04 August 2017

Takeshi Sunaoshi
Affiliation:
Hitachi High-Technologies Corp., Application Development Department, Ibaraki, Japan.
Manabu Shirai
Affiliation:
Hitachi High-Technologies Corp., Application Development Department, Ibaraki, Japan.
Satoshi Okada
Affiliation:
Hitachi High-Technologies Corp., Electron Microscope Systems Design 1st Dept., Ibaraki, Japan.
Kazutoshi Kaji
Affiliation:
Hitachi High-Technologies Corp., Electron Microscope Systems Design 1st Dept., Ibaraki, Japan.
Edgar Voelkl
Affiliation:
Hitachi High Technologies America, NSD, Clarksburg, Maryland, USA.
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Abstract

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© Microscopy Society of America 2017 

References

[1] Benner, G, et al, Microsc. Microanal 10(Suppl. 2 2004). p 860.CrossRefGoogle Scholar
[2] Krivanek, O & Gubbens et N Dellby, A Microsc. Microanal. Microstruct 2 1991). pp 315332.CrossRefGoogle Scholar
[3] Colliex, C, Mory, C, Olins, A, Olins, D & Tence, M J of Microscopy 153 1989). pp 121.CrossRefGoogle Scholar
[4] Sunaoshi, T, Kaji, K, Orai, Y, Schamp, CT & Voelkl, E Microsc. Microanal 22(Suppl3 2016). p 604.CrossRefGoogle Scholar
[5] Zaluzec, N Ultramicroscopy 151 2015). pp 240249.CrossRefGoogle Scholar
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