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Electron Holography of CMOS Devices with Epitaxial Layers

Published online by Cambridge University Press:  27 August 2014

M. A. Gribelyuk ,
V. Ontalus ,
T. N. Adam ,
F. H. Baumann  and
P. R. Ronsheim
M. A. Gribelyuk
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
V. Ontalus
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
T. N. Adam
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
F. H. Baumann
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA
P. R. Ronsheim
Affiliation:
IBMSystems and Technology Group, Hopewell Junction, NY 12533, USA

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 252 - 253
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Jin, B, Brask, J, Datta, S, Dewey, G, et.al, in Electrochem.Soc. Proc (2004) vol. 2004-07, pp. 111-122.Google Scholar
[2] Yang, B.(Frank), Takalkar, R, Ren, Z, et.al., IEDM Tech.Dig., 51 (2008).Google Scholar
[3] McCartney, M. R Software package for reconstruction in electron holography.Google Scholar
[4] Baumann, F. H F-STRAIN: Software algorithm for extraction of strain from nanobeam diffraction data (to be published).Google Scholar
[5] Authors acknowledge L. Kimball (IBM) for technical help.Google Scholar