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Electron Beam Effects on Silicon Oxide Films – Structure and Electrical Properties

Published online by Cambridge University Press:  01 August 2018

Krishna Kanth Neelisetty
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany TU Darmstadt, Darmstadt, Germany
Sebastian Gutsch
Affiliation:
IMTEK Nanotechnologie, Freiburg, Germany
Falk von Seggern
Affiliation:
TU Darmstadt, Darmstadt, Germany
Alan Molinari
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany TU Darmstadt, Darmstadt, Germany
Alexander Vahl
Affiliation:
Technische Fakultät der CAU Kiel, Institut für Materialwissenschaft, Kiel, Germany
Xiaoke Mu
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany
Torsten Scherer
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany
Chakravadhanula VS Kiran
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany Helmholtz Institute Ulm, Karlsruhe Institute of technology, Eggenstein-Leopoldshafen, Germany
Christian Kübel
Affiliation:
Institute of Nanotechnology, Karlsruhe Institute of Technology, Eggenstein-Leopoldshafen, Germany Helmholtz Institute Ulm, Karlsruhe Institute of technology, Eggenstein-Leopoldshafen, Germany Karlsruhe Nano- Micro Facility, Karlsruhe Institute of technology, Eggenstein-Leopoldshafen, Germany

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2018 

References

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