Effect of Crystal Orientation on Imaging Contrast and Sputter Results during Focused Ion Beam Milling of Cu studied by FIB, EBSD, SEM, and AFM

U Wendt; G Nolze; H Heyse

doi:10.1017/S1431927606061812

Effect of Crystal Orientation on Imaging Contrast and Sputter Results during Focused Ion Beam Milling of Cu studied by FIB, EBSD, SEM, and AFM

Published online by Cambridge University Press: 31 July 2006

U Wendt ,

G Nolze and

H Heyse

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U Wendt: Affiliation:
Otto-von-Guericke University
G Nolze: Affiliation:
Federal Institute of Materials Research and Testing
H Heyse: Affiliation:
Otto-von-Guericke University

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Extended abstract of a paper presented at Microscopy and Microanalysis 2006 in Chicago, Illinois, USA, July 30 – August 3, 2006

Type: Abstract
Information: Microscopy and Microanalysis , Volume 12 , Issue S02 , August 2006 , pp. 1302 - 1303

DOI: https://doi.org/10.1017/S1431927606061812 [Opens in a new window]

Article contents

Effect of Crystal Orientation on Imaging Contrast and Sputter Results during Focused Ion Beam Milling of Cu studied by FIB, EBSD, SEM, and AFM

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