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Disconnection-mediated twin junction migration mechanism in FCC metals

Published online by Cambridge University Press:  30 July 2021

Thomas Kaufman ,
Kongtao Chen ,
Jian Han ,
Fan Cao ,
Mingjie Xu ,
Fan Ye ,
David Srolovitz  and
Xiaoqing Pan
Thomas Kaufman
Affiliation:
University of California, Irvine, United States
Kongtao Chen
Affiliation:
University of Pennsylvania, United States
Jian Han
Affiliation:
City University of Hong Kong, United States
Fan Cao
Affiliation:
Wuhan University, United States
Mingjie Xu
Affiliation:
Irvine Materials Research Institute, United States
Fan Ye
Affiliation:
Xi An Jiao Tong University, United States
David Srolovitz
Affiliation:
City University of Hong Kong, United States
Xiaoqing Pan
Affiliation:
Department of Physics and Astronomy, University of California, Irvine, CA 92697, Irvine, California, United States

Abstract

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Type
Defects in Materials: How We See and Understand Them
Information
Microscopy and Microanalysis , Volume 27 , Supplement S1 , August 2021 , pp. 3100 - 3102
Copyright
Copyright © The Author(s), 2021. Published by Cambridge University Press on behalf of the Microscopy Society of America

References

Thomas, S.L., et al. , PNAS 116 (2019), 8756–CrossRefGoogle Scholar
Zhu, Q., et al. , Nat. Commun. 10 (2019), 1–8Google Scholar
Thomas, S.L., et al. , Acta Mater. 113 (2016), 301–310CrossRefGoogle Scholar