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Composition Analysis of a Thin Gate Oxide Layer Using Model-Based EELS Quantification

Published online by Cambridge University Press:  01 August 2010

Q Jin
Affiliation:
Micron Technology, Inc

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Copyright
Copyright © Microscopy Society of America 2010