Hostname: page-component-76fb5796d-vvkck Total loading time: 0 Render date: 2024-04-26T06:31:11.790Z Has data issue: false hasContentIssue false
  • English
  • Français

Authors' Response

Published online by Cambridge University Press:  01 August 2004

A.C. Diebold ,
B. Foran ,
C. Kisielowski ,
D.A. Muller ,
S.J. Pennycook ,
E. Principe  and
S. Stemmer
A.C. Diebold
Affiliation:
International SEMATECH
B. Foran
Affiliation:
International SEMATECH
C. Kisielowski
Affiliation:
National Center for Electron Microscopy
D.A. Muller
Affiliation:
Bell Laboratories Lucent Technologies
S.J. Pennycook
Affiliation:
Oak Ridge National Laboratories
E. Principe
Affiliation:
Applied Materials
S. Stemmer
Affiliation:
University of California-Santa Barbara
Get access

Extract

The main purpose of the article by A.C. Diebold and coworkers (2003) is to propose a robust method for determination of gate oxide thickness. O'Keefe objects to a statement in this paper that “Lattice images do NOT depict the projected atom columns; instead, they are interference patterns of the directly transmitted beam with diffracted beams.”

Type
Letter to the Editor
Information
Microscopy and Microanalysis , Volume 10 , Issue 4 , August 2004 , pp. 399 - 400
Copyright
© 2004 Microscopy Society of America

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Coene, W.M.J., Thust, A., Op De Beeck, M., & Van Dyck, D. (1996). Maximum likelihood method for focus-variation image reconstruction in high resolution transmission electron microscopy. Ultramicroscopy 64, 109–135.Google Scholar
Diebold, A.C., Foran, B., Kisielowski, C., Muller, D.A., Pennycook, S.J., Principe, E., Stemmer, S. (2003). Thin dielectric film thickness determination by advanced transmission electron microscopy. Microsc Microanal 9, 493–508.Google Scholar
Kirkland, E.J. (1998). Advanced Computing in Electron Microscopy. New York: Plenum Press.
Kisielowski, C., Nelson, E.C., Song, C., Kilaas, R., & Thust, A. (2000). Aberration corrected lattice imaging with sub-Angstrom resolution. Microsc Microanal 6(Suppl. 2), 16–17.Google Scholar
Lichte, H. (1991). Optimum focus for taking electron holograms. Ultramicroscopy 38, 13.Google Scholar