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Atomic and electronic structure study of a Co 2 FeAl 0.5 Si 0.5 half-metal thin film on Si(111)

Published online by Cambridge University Press:  25 July 2016

Demie Kepaptsoglou
Affiliation:
SuperSTEM Laboratory, SciTech Daresbury Campus, United Kingdom
Barat Kuerbanjiang
Affiliation:
Department of Physics, University of York, United Kingdom
Zlatko Nedelkoski
Affiliation:
Department of Physics, University of York, United Kingdom
Arsham Ghasemi
Affiliation:
Department of Physics, University of York, United Kingdom
Shinya Yamada
Affiliation:
Department of Systems Innovation, Osaka University, Japan
Kohei Hamaya
Affiliation:
Department of Systems Innovation, Osaka University, Japan
Atsufumi Hirohata
Affiliation:
Department of Electronics, University of York, United Kingdom
QuentinM. Ramasse
Affiliation:
SuperSTEM Laboratory, SciTech Daresbury Campus, United Kingdom
Vlado K. Lazarov
Affiliation:
Department of Physics, University of York, United Kingdom
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© Microscopy Society of America 2016 

References

[1] de Groot, R. A., et al, Phys. Rev. Lett 50 (1983). p. 2024.CrossRefGoogle Scholar
[2] Kawano, M., et al, Jpn. J. Appl. Phys 52 (2013). p. 04CM06.CrossRefGoogle Scholar
[3] Kuerbanjiang, B., et al, submitted (2016).Google Scholar
[4] This work was funded by the Engineering and Physical Sciences Research Council (EPSRC) through grants EP/K03278X/1 and EP/K032852/1. The SuperSTEM Laboratory is the U.K. National Facility for Aberration-Corrected STEM, supported by the EPSRC.Google Scholar
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Atomic and electronic structure study of a Co 2 FeAl 0.5 Si 0.5 half-metal thin film on Si(111)
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Atomic and electronic structure study of a Co 2 FeAl 0.5 Si 0.5 half-metal thin film on Si(111)
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