Surface chemistry and topography of materials are generally preponderant factors in a series of material properties, such as adhesion, wettability, friction and optical properties [1]. Wettability of films, for example, can be altered significantly by modifying its surface roughness and also by incorporating functional groups. Plasma treatment is a powerful and versatile way to modify surface properties of amorphous nitrogen-incorporated carbon thin films (a-C:H(N)) and obtain materials with improved properties, once it is possible to modify the surfaces in a controlled way by specific settings of plasma conditions. [2 - 4]