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Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications
Published online by Cambridge University Press: 03 August 2008
Extract
Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008
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- Research Article
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- © 2008 Microscopy Society of America
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