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Extended Electron Loss Fine Structure Analysis of Silicon-K Edges Using an Imaging Filter

Published online by Cambridge University Press:  02 July 2020

J. A. Former ,
E. C. Buck ,
D. M. Strachan  and
N. J. Hess
J. A. Former
Affiliation:
Argonne National Laboratory, Argonn, IL, 6043
E. C. Buck
Affiliation:
Argonne National Laboratory, Argonn, IL, 6043
D. M. Strachan
Affiliation:
Argonne National Laboratory, Argonn, IL, 6043
N. J. Hess
Affiliation:
Pacific Northwest National Laboratory, Richland, WA99352
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Extract

The recent availability of Gatan's imaging filter (GIF) has improved detail in electron energy loss spectroscopy (EELS) owing to the greatly reduced channel-to-channel gain variation. In particular, extended electron loss fine structure (EXELFS) can be rapidly obtained with relatively low beam exposures to the sample. Previous studies using EXELFS (of which there are relatively few) have been limited to rather beam-insensitive samples and have required extensive effort to correct detector gain variation. [1,2] We will discuss here some of our ongoing work on use of EXELFS as a complement to other analytical microscopy techniques to study changes in materials caused by radiation damage (ion and alpha) and transmutation. Using an imaging filter as a spectrometer, we have obtained EXELFS from a rather beam-sensitive alkali aluminosilicate, pollucite (CsAlSi2O6).

Type
Nanophase and Amorphous Materials
Information
Microscopy and Microanalysis , Volume 4 , Issue S2: Proceedings: Microscopy & Microanalysis '98, Microscopy Society of America 56th Annual Meeting, Microbeam Analysis Society 32nd Annual Meeting, Atlanta, Georgia July 12-16, 1998 , July 1998 , pp. 706 - 707
Copyright
Copyright © Microscopy Society of America

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References

References:

1.Haskel, D. et al., “EXELFS as a tool for quantifying phase distributions in materials,” Ultramicroscopy 58 353 (1995).CrossRefGoogle Scholar
2.Okamoto, J. K. et al, “EELS analysis of the electronic structure and microstructure of metals.” in Transmission Electron Energy Loss Spectroscopy in Materials Science, Disko, M. M., Ahn, C. C. and Fultz, B., eds., Minerals, Metals & Materials Society (Warrendale, PA, 1992) pp. 183-216.Google Scholar
3. EL/P software, version 3.0, (1997) Gatan Inc., Pleasanton CA.Google Scholar
4.Hess, N. J. et al, ‘initial results from Zr, U, and Pu XAS on self-radiation effects in glass and zircon,” to appear in Materials Research and Chemistry.Google Scholar
5.Badyal, Y., Fortner, J. A., and Weber, W. J., unpublished results.Google Scholar
6. This work was sponsored by the U.S. Department of Energy, Office of Environmental Restoration and Waste Management, under contract W-31-109-ENG-38.Google Scholar