A silicon microfabrication technique has been applied toward the development of a Miniature Scanning Electron Microscope (MSEM). The fabrication technology is not only precise but is inexpensive compared to conventional methods of electron microscope construction and is easily extended to the construction of arrays of MSEMs for applications in high throughput e-beam lithography and wafer inspection.

An electrostatic electron lens consists of a series of planar electrodes with central apertures that are precisely aligned to and electrically isolated from one another. This structure is fabricated using silicon as the electrode material and Pyrex optical fibers as the insulators. The electrodes are fabricated on four inch (100) orientation silicon wafers that are patterned on both sides and anisotropically etched to form four orthogonal v-grooves and an open diaphragm with a circular aperture in the center. The apertures are formed by reactive ion etching. The wafers are then diced to create approximately 100 7 mm by 9 mm electrodes.