Deposition of zirconia inside hollow substrates in remote Ar-O2-H2 post- discharges is considered. The inner surface of cylindrical substrates is coated by a thin film of monoclinic zirconia at 573 K and above. A complete modelling, required to control the process, is developed by solving the conservation equations of continuity, momentum and energy. By this means, the thickness homogeneity of the layers is improved and almost constant deposition rates are obtained along the substrate.