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Optimization of X-ray emission from a laser-produced plasma in a narrow wavelength band

Published online by Cambridge University Press:  09 March 2009

G. E. Van Dorssen ,
E. Louis  and
F. Bijkerk
G. E. Van Dorssen
Affiliation:
Association Euratom-FOM, FOM Institute for Plasma Physics Rijnhuizen, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands
E. Louis
Affiliation:
Association Euratom-FOM, FOM Institute for Plasma Physics Rijnhuizen, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands
F. Bijkerk
Affiliation:
Association Euratom-FOM, FOM Institute for Plasma Physics Rijnhuizen, P.O. Box 1207, 3430 BE Nieuwegein, The Netherlands
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Abstract

The X-ray emission from laser-produced plasmas at an X-ray wavelength of approximately 10.4 nm was measured for Al and Gd target materials. The laser power density on the target surface was varied between 1.5 × 1010 and 3 × 1012 W/cm2 to obtain different electron temperatures. The output from the plasma was measured using an X-ray reflecting Pd-C multilayer coating as a wavelength-selective element and a diamond photoconductive detector. The emission at 10.4 nm is strongest at the low end of the power density range investigated. A strong increase is found for Al targets due to a contribution of line radiation, which is not present in the Gd plasmas. The measured conversion efficiency for Al plasmas was (4.5 ± 1)% in a 3% bandwidth at an X-ray wavelength of 10.4 nm.

Type
Research Article
Information
Laser and Particle Beams , Volume 10 , Issue 4 , December 1992 , pp. 759 - 765
Copyright
Copyright © Cambridge University Press 1992

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