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Stability of different plasma sheaths near a dielectric wall with secondary electron emission

Published online by Cambridge University Press:  04 December 2019

Shaowei Qing Open the ORCID record for Shaowei Qing [Opens in a new window] ,
Jianguo Wei ,
Wen Chen ,
Shengli Tang  and
Xiaogang Wang
Shaowei Qing*
Affiliation:
Key Laboratory of Low-grade Energy Utilization Technologies and Systems, Chongqing University, Ministry of Education, Chongqing400044, China Institute of Energy and Power Engineering, Chongqing University, Chongqing400044, China
Jianguo Wei
Affiliation:
Shanxi Key Laboratory of Plasma Physics and Applied Technology, Xi’an710100, China Academy of Aerospace Propulsion Technology, Xi’an710100, China
Wen Chen
Affiliation:
Key Laboratory of Low-grade Energy Utilization Technologies and Systems, Chongqing University, Ministry of Education, Chongqing400044, China Institute of Energy and Power Engineering, Chongqing University, Chongqing400044, China
Shengli Tang
Affiliation:
Key Laboratory of Low-grade Energy Utilization Technologies and Systems, Chongqing University, Ministry of Education, Chongqing400044, China Institute of Energy and Power Engineering, Chongqing University, Chongqing400044, China
Xiaogang Wang
Affiliation:
School of Physics, Harbin Institute of Technology, Harbin150001, China
*
†Email address for correspondence: qshaowei@cqu.edu.cn
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Abstract

The linear theory stability of different collisionless plasma sheath structures, including the classic sheath, inverse sheath and space-charge limited (SCL) sheath, is investigated as a typical eigenvalue problem. The three background plasma sheaths formed between a Maxwellian plasma source and a dielectric wall with a fully self-consistent secondary electron emission condition are solved by recent developed 1D3V (one-dimensional space and three-dimensional velocities), steady-state, collisionless kinetic sheath model, within a wide range of Maxwellian plasma electron temperature $T_{e}$. Then, the eigenvalue equations of sheath plasma fluctuations through the three sheaths are numerically solved, and the corresponding damping and growth rates $\unicode[STIX]{x1D6FE}$ are found: (i) under the classic sheath structure (i.e. $T_{e}<T_{ec}$ (the first threshold)), there are three damping solutions (i.e. $\unicode[STIX]{x1D6FE}_{1}$, $\unicode[STIX]{x1D6FE}_{2}$ and $\unicode[STIX]{x1D6FE}_{3}$, $0>\unicode[STIX]{x1D6FE}_{1}>\unicode[STIX]{x1D6FE}_{2}>\unicode[STIX]{x1D6FE}_{3}$) for most cases, but there is only one growth-rate solution $\unicode[STIX]{x1D6FE}$ when $T_{e}\rightarrow T_{ec}$ due to the inhomogeneity of sheath being very weak; (ii) under the inverse sheath structure, which arises when $T_{e}>T_{ec}$, there are no background ions in the sheath so that the fluctuations are stable; (iii) under the SCL sheath conditions (i.e. $T_{e}\geqslant T_{e\text{SCL}}$, the second threshold), the obvious ion streaming through the sheath region again emerges and the three damping solutions are again found.

Keywords

plasma instabilitiesplasma sheaths
Type
Research Article
Information
Journal of Plasma Physics , Volume 85 , Issue 6 , December 2019 , 905850609
Copyright
© Cambridge University Press 2019 

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