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Post-pinch generation of electron beam in a low energy Mather-type plasma focus device

Published online by Cambridge University Press:  09 May 2013

R. A. BEHBAHANI
Affiliation:
Department of Physics, University of Tehran, N. Kargar Ave, Tehran 14399, Iran (aghamir@ut.ac.ir)
F. M. AGHAMIR
Affiliation:
Department of Physics, University of Tehran, N. Kargar Ave, Tehran 14399, Iran (aghamir@ut.ac.ir)

Abstract

The post-pinch generation of electron beam in a low energy Mather-type plasma focus (PF) device has been investigated. A fast-calibrated Rogowski coil was used to monitor the emission of electron beam. A two-channel diode X-ray spectrometer along with suitable filters provided the records of energy spectrum of X-ray radiation. Single time-period emissions of electron beam with duration of 100 to 20 ns were recorded in the high range of the device operating pressure (0.8–2 mbar). However, in the low range regime (0.2–0.8 mbar), occurrence of single spike electron beam with duration of 150 ± 50 ns, as well as multi-emission of electrons with duration of 400 ± 50 ns, was visible. A multi-peak of tube voltage along with multi-time-period radiation of X-rays dominated by copper lines (Cukα and Cukβ) was noticeable in the low-pressure range. The generated electron beam during the post-pinch phase of anomalous resistances is suspected to be the main source of X-ray radiation. This can also be related to the turbulence of the plasma column during the occurrence of anomalous resistances.

Type
Papers
Copyright
Copyright © Cambridge University Press 2013 

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References

Ahmad, S., Shafiq, M. and Zakaullah, M. 2006 Appl. Phys. Lett. 89, 061503.CrossRefGoogle Scholar
Behbahani, R. A. and Aghamir, F. M. 2011 Phys. Plasmas 18, 103302.CrossRefGoogle Scholar
Behbahani, R. A. and Aghamir, F. M. 2012 J. Appl. Phys. 111, 043304.CrossRefGoogle Scholar
Bernard, A., Bruzzone, H., Choi, P., Chuaqui, H., Gribkov, V., Herrera, J., Hirana, K., Krejei, A., Lee, S., Luo, C.et al., 1998 Moscow J. Phys. Soc. 8, 93.Google Scholar
Bruzzone, H. 2001 Nukleonika 46, S3.Google Scholar
Dysan, N. A. 1990 X-Rays in Atomic and Nuclear Physics. Cambridge, UK: Cambridge University Press.CrossRefGoogle Scholar
Gribkov, V. A., Korzhavin, V. M., Nikulin, V. Y., Skizkov, G. V., Filippov, N. V. and Filippova, T. I. 1972 Proceedings of 5th European Conference on Controlled Fusion and Plasma Physics, Grenoble, Vol. 1, p. 64.Google Scholar
Gullickson, R. L. and Barlett, R. H. 1975 Adv. X-Ray Anal. 18, 184.Google Scholar
Hirano, K., Kaneko, I., Shimoda, K. and Yamamoto, T. 1990 Jpn. J. Appl. Phys. 29, 1182.CrossRefGoogle Scholar
Jakubowski, L., Sadowski, M. and Baronova, E. O. 1996 Proc. ICCP 96, 1326.Google Scholar
Jakubowski, L., Sadowski, M., Baronova, E. O. and Vikhrev, V. V. 1997 AIP Conf. Proc. 812, 260263; Proceedings of 4th International Conference on Dense Z-Pinches, Vancouver.CrossRefGoogle Scholar
Jakubowski, L., Sadowski, M., Baronova, E. O. and Vikhrev, V. V. 1998 Proceedings of the 12th International Conference on High-Power Particle Beams, Haifa, Vol. 2, p. 615.Google Scholar
Johnson, D. J. 1974 Rev. Sci. Instrum. 45, 191.CrossRefGoogle Scholar
Kelly, H. and Marquez, A. 1995 Meas. Sci. Technol. 6, 400.CrossRefGoogle Scholar
Kotov, Y. A. and Sokovnin, S. Y. 2000 IEEE Trans. Plasma Sci. 28, 133.CrossRefGoogle Scholar
Lee, P., Feng, X., Zhang, G. X., Liu, M. H. and Lee, S. 1997 Plasma Sources Sci. Technol. 6, 343.CrossRefGoogle Scholar
Lee, S., Saw, S. H., Abdou, A. E. and Torreblanca, H. 2010 J. Fusion Energy 30, 277.CrossRefGoogle Scholar
Lee, S., Saw, S. H., Rawat, R. S., Lee, P., Talebitaher, A., Abdou, A. E., Chong, P. L., Roy, F., Singh, A., Wong, D. and Devi, K. 2011 IEEE Trans. Plasma Sci. 39, 3196.Google Scholar
Mohanty, S. R., Neog, N. K., Bhuyan, H., Rout, R. K., Rawat, R. S. and Lee, P. 2007 Jpn. J. Appl. Phys. 46, 303.CrossRefGoogle Scholar
Mohanty, S. R., Sakamoto, T., Kobayashi, Y., Song, I., Watanabe, M., Kawamura, T., Okino, A., Horioka, K. and Hotta, E. 2006 Rev. Sci. Instrum. 77, 043506.CrossRefGoogle Scholar
Neff, W., Eberle, J., Holz, R., Lebert, R. and Richter, F. 1989 Proc. SPIE 1140, 13.CrossRefGoogle Scholar
Neog, N. K. and Mohanty, S. R. 2007 Phys. Lett. A 361, 377.CrossRefGoogle Scholar
Neog, N. K., Mohanty, S. R. and Borthakur, T. K. 2008 Phys. Lett. A 372, 2294.CrossRefGoogle Scholar
Neog, N. K., Mohanty, S. R. and Hotta, E. 2006 J. Appl. Phys. 99, 013302.CrossRefGoogle Scholar
Patran, A., Tan, L. C., Stoenescu, D., Rafigue, M. S., Rawat, R. S., Springham, S. V., Tan, T. L., Lee, P., Zakaullah, M. and Lee, S. 2005 Plasma Sources Sci. Technol. 14, 549.CrossRefGoogle Scholar
Peacock, N. J., Hobby, M. G. and Morgan, P. D. 1971 In Proceedings of the 4th International Conference on Plasma Physics and Controlled Nuclear Fusion Research, Madison, WI, USA, Vol. 1, 537 pp.Google Scholar
Rawat, R. S., Zhang, T., Phua, C. B. L., Then, X. Y., Chandra, K. A., Lin, X., Patran, A. and Lee, P. 2004 Plasma Sources Sci. Technol. 13, 569.CrossRefGoogle Scholar
Sadowski, M. and Scholz, M. 2003 In Proceedings of the 30th EPS Conference on Controlled Fusion and Plasma Physics, St. Petersburg, ECA Vol. 27A, p. 1.Google Scholar
Smith, J. R., Luo, C. M., Rhee, M. J. and Schneider, R. F. 1985 Phys.Fluids 28, 2305.CrossRefGoogle Scholar
Stygar, W., Gerdin, G., Venneri, F. and Mandrekas, J. 1982 Nucl. Fusion 22, 1161.CrossRefGoogle Scholar
Trubnikov, B. A. and Zdanov, S. K. 1976 ZETP 70, 92.Google Scholar
Vaughan, D. 1986 X-Ray Data Booklet. Berkeley, CA: Lawrence Berkeley Laboratory, University of California.Google Scholar
Verma, R., Roshan, M. V., Malik, F., Lee, P., Lee, S., Springham, S. V., Tan, T. L., Krishnan, M. and Rawat, R. S. 2008 Plasma Sources Sci. Technol. 17, 04502.CrossRefGoogle Scholar
Wong, C. S., Choi, P., Leong, W. S. and Singh, J. 2002 Jpn. J. Appl. Phys. 41, 3943.CrossRefGoogle Scholar
Wong, D., Patran, A., Tan, T. L., Rawat, R. S. and Lee, P. 2004 IEEE Trans. Plasma Sci. 32, 2227.CrossRefGoogle Scholar
Zakaullah, M. and Woreley, J. 2000 J. Appl. Phys. 85, 1251.CrossRefGoogle Scholar
Zhang, T., Lin, J., Patran, A., Wong, D., Hassan, S. M., Mahmood, S., White, T., Tan, T. L., Springham, S. V., Lee, S., et al. 2005 Plasma Sources Sci. Technol. 14, 549.CrossRefGoogle Scholar
Zhang, T., Lin, J., Patran, A., Wong, D., Hassan, S. M., Mahmood, S., White, T., Tan, T. L., Springham, S. V., Lee, S.et al., 2007 Plasma Sources Sci.Technol. 16, 250.CrossRefGoogle Scholar