Hostname: page-component-77c89778f8-vpsfw Total loading time: 0 Render date: 2024-07-18T15:01:32.509Z Has data issue: false hasContentIssue false

The optimum shielding around a test charge in plasmas containing two negative ions

Published online by Cambridge University Press:  15 February 2011

W. M. MOSLEM
Affiliation:
Department of Physics, Faculty of Science, Port Said University, Port Said, Egypt (wmmoslem@hotmail.com)
R. SABRY
Affiliation:
Theoretical Physics Group, Department of Physics, Faculty of Science, Mansoura University, Damietta Branch, New Damietta 34517, Egypt
P. K. SHUKLA
Affiliation:
UB International Chair, International Center for Advanced Studies in Physical Sciences, Faculty of Physics & Astronomy, Ruhr University Bochum, D-44780 Bochum, Germany

Abstract

This paper focuses on the progress in understanding the shielding around a test charge in the presence of ion-acoustic waves in multispecies plasmas, whose constituents are positive ions, two negative ions, and Boltzmann distributed electrons. By solving the linearized Vlasov equation with Poisson equation, the Debye–Hückel screening potential and wakefield (oscillatory) potential distribution around a test charge particle are derived. It is analytically found that both the Debye–Hückel potential and the wakefield potential are significantly modified due to the presence of two negative ions. The present results might be helpful to understand and to form new materials from plasmas containing two negative ions such as Xe+ − F − SF6 and Ar+ − F − SF6 plasmas, as well as to tackle extension of the test charge problem in multinegative ions' coagulation/agglomeration.

Type
Papers
Copyright
Copyright © Cambridge University Press 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1]Massey, H. S. W. 1976 Negative Ions, 3rd edn.Cambridge: Cambridge University Press, p. 663.Google Scholar
[2]Swider, W. 1988 Ionospheric Modeling, (ed. Korenkov, J. N.). Basel: Birkhauser, p. 403.CrossRefGoogle Scholar
[3]Portnyagin, Y. I., Klyuev, O., Shidlovsky, A., Evdokimov, A., Buzdigar, T., Matukhin, P., Pasynkov, S., Shamshev, K., Sokolov, V. V. and Semkin, N. 1991 Adv. Space Res. 11, 89.Google Scholar
[4]Chaizy, P. H., Rème, H., Sauvaud, J., D'uston, C., Lin, R., Larson, D., Mitchell, D., Anderson, K., Carlson, C., Korth, A. and Mendis, D. A. 1991 Nature (London) 349, 393.Google Scholar
[5]Coates, A. J., Crary, F., Lewis, G., Young, D., Waite, J. H. Jr. and Sittler, E. C. Jr. 2007 Geophys. Res. Lett. 34, L22103.Google Scholar
[6]Nakamura, Y., Nakamura, M. and Itoh, T. 1976 Phys. Rev. Lett. 37, 209.Google Scholar
[7]Tran, M. Q. and Coquerand, S. 1976 Phys. Rev. A 14, 2301.CrossRefGoogle Scholar
[8]Wong, A. Y., Mamas, D. L. and Arnush, D. 1975 Phys. Fluids 18, 1489.CrossRefGoogle Scholar
[9]Ahearn, A. J. and Hannay, N. B. 1953 J. Chem. Phys. 21, 119.CrossRefGoogle Scholar
[10]Song, B., D'Angelo, N. and Merlino, R. L. 1991 Phys. Fluids B 3, 284.CrossRefGoogle Scholar
[11]Sato, N. 1994 Plasma Sources Sci. Technol. 3, 395.CrossRefGoogle Scholar
[12]Koga, K. and Kawai, Y. 1999 Japan. J. Appl. Phys. 38, 1553.CrossRefGoogle Scholar
[13]Nakamura, Y., Bailung, H. and Lonngren, K. E. 1999 Phys. Plasmas 6, 3466.CrossRefGoogle Scholar
[14]Nakamura, Y., Odagiri, T. and Tsukabayashi, I. 1997 Plasma Phys. Control. Fusion 39, 105.Google Scholar
[15]Ludwig, G. O., Ferreira, J. L. and Nakamura, Y. 1984 Phys. Rev. Lett. 52, 275.Google Scholar
[16]Wong, A. Y., Mamas, D. L. and Arnush, D. 1975 Phys. Fluids 18, 1489.CrossRefGoogle Scholar
[17]Das, G. C. 1979 Plasma Phys. 21, 257; Das, G. C. and Singh, Kh. I. 1991 Aust. J. Phys. 44, 523.Google Scholar
[18]Moslem, W. M. 1999 J. Plasma Phys. 61, 177; Moslem, W. M. 2000 J. Plasma Phys. 63, 139; El-Labany, S. K., El-Warraki, S. A. and Moslem, W. M. 2000 J. Plasma Phys. 63, 343.CrossRefGoogle Scholar
[19]Ichiki, R., Yoshimura, S., Watanabe, T., Nakamura, Y. and Kawai, Y. 2002 Phys. Plasmas 9, 4481.CrossRefGoogle Scholar
[20]Singh, D. K. and Malik, H. K. 2008 IEEE Trans. Plasma Sci. 36, 462; Malik, H. K. and Stroth, U. 2008 Plasma Sources Sci. Technol. 17, 035005.CrossRefGoogle Scholar
[21]Sabry, R., Moslem, W. M. and Shukla, P. K. 2009 Phys. Plasmas 16, 032302; Moslem, W., Abdelsalam, U., Sabry, R. and Shukla, P. K. 2010 New J. Phys. 12, 073010; Moslem, W., Abdelsalam, U., Sabry, R., El-Shamy, E. F., and El-Labany, S. K. 2010 J. Plasma Phys. 76, 453.CrossRefGoogle Scholar
[22]Mamun, A. A., Shukla, P. K. and Eliasson, B. 2009 Phys. Rev. E, 80, 046406; Sharma, S. K. and Bailunga, H. 2010 Phys. Plasmas 17, 032301.Google Scholar
[23]Ichiki, R., Shindo, M., Yoshimura, S., Watanabe, T. and Kawai, Y. 2001 Phys. Plasmas 8, 4275.Google Scholar
[24]Coates, A. J., Crary, F., Lewis, G., Young, D., Waite, J. H. Jr., Sittler, E. C. Jr. 2007 Geophys. Res. Lett. 34, L22103.Google Scholar
[25]Neufeld, J. and Ritchie, R. H. 1955 Phys. Rev. 98, 1632.CrossRefGoogle Scholar
[26]Sanmartin, J. R. and Lam, S. H. 1971 Phys. Fluids 14, 62.Google Scholar
[27]Chen, L., Langdon, A. B. and Lieberman, M. A. 1973 J. Plasma Phys. 9, 311.CrossRefGoogle Scholar
[28]Nambu, M. and Akama, H. 1985 Phys. Fluids 28, 2300.Google Scholar
[29]Ishihara, O. and Vladimirov, S. V. 1997 Phys. Plasmas 4, 69; Ishihara, O., Vladimirov, S. V. and Cramer, N. F. 2000 Phys. Rev. E 61, 7246.Google Scholar
[30]Salimullaha, M. and Shukla, P. K. 1998 Phys. Plasmas 5, 4205; Nambu, M., Salimullah, M. and Bingham, R. 2001 Phys. Rev. E 63, 056403.CrossRefGoogle Scholar
[31]Kourakis, I. and Shukla, P. K. 2003 Phys. Lett. A 317, 156; Shukla, P. K. and Eliasson, B. 2008 Phys. Lett. A 372, 2897.Google Scholar
[32]Shukla, P. K. and Stenflo, L. 2001 Plasma Phys. Rep. 27, 904.CrossRefGoogle Scholar
[33]Ali, S., Nasim, M. H. and Murtaza, G. 2003 Phys. Plasmas 10, 4207; Ali, S., Murtaza, G. and Nasim, M. H. 2005 Phys. Plasmas 12, 072104; Ali, S., Murtaza, G. and Nasim, M. H. 2005 Phys. Plasmas 12, 072104.Google Scholar
[34]Ali, S., Moslem, W. M. and Shukla, P. K. 2008 Phys. Lett. A, 372, 6650; Ali, S. and Shukla, P. K. 2008 Phys. Lett. A 372, 4827; Ali, S. 2009 Phys. Plasmas 16, 054502; Ali, S. 2009 Phys. Plasmas 16, 113706.Google Scholar