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A structural and calorimetric study of the transformations in sputtered Al–Mn and Al–Mn–Si films

Published online by Cambridge University Press:  31 January 2011

L. C. Chen ,
F. Spaepen ,
J. L. Robertson ,
S. C. Moss  and
K. Hiraga
L. C. Chen
Affiliation:
Division of Applied Sciences, Harvard University, Cambridge, Massachusetts 02138
F. Spaepen
Affiliation:
Division of Applied Sciences, Harvard University, Cambridge, Massachusetts 02138
J. L. Robertson
Affiliation:
Physics Department, University of Houston, Houston, Texas 77204-5504
S. C. Moss
Affiliation:
Physics Department, University of Houston, Houston, Texas 77204-5504
K. Hiraga
Affiliation:
Institute for Materials Research, Tohoku University, Sendai 980, Japan
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Abstract

Scanning and isothermal calorimetry, together with x-ray diffraction and high resolution transmission electron microscopy (TEM), have been used to characterize Al–Mn and Al–Mn–Si films sputtered onto substrates at 60 °C, 45 °C, and −100 °C. In the case of Al0.83Mn0.17, the monotonically decreasing isothermal calorimetric signal, characteristic of a grain growth process, has proved decisive in identifying the as-sputtered “amorphous” state as microquasicrystalline, with an average grain size of ∼ 20 Å, in agreement with an estimate of correlation range from the x-ray pattern. The TEM at 400 keV reveals well-defined atomic or lattice images in annealed films but only barely resolved grains (ordered clusters) in the as-sputtered films. The relation between the metallic glass and the microquasicrystalline state in these alloys is discussed.

Type
Articles
Information
Journal of Materials Research , Volume 5 , Issue 9 , September 1990 , pp. 1871 - 1879
Copyright
Copyright © Materials Research Society 1990

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