Hostname: page-component-788cddb947-kc5xb Total loading time: 0 Render date: 2024-10-19T00:34:11.016Z Has data issue: false hasContentIssue false
  • English
  • Français

Solid state interfacial reactions of Ti3Al with Si3N4 and SiC

Published online by Cambridge University Press:  31 January 2011

T.C. Chou  and
A. Joshi
T.C. Chou
Affiliation:
Research and Development Division, Lockheed Missiles and Space Company, Inc., O/93-10, B/204, 3251 Hanover Street, Palo Alto, California 94304-1191
A. Joshi
Affiliation:
Research and Development Division, Lockheed Missiles and Space Company, Inc., O/93-10, B/204, 3251 Hanover Street, Palo Alto, California 94304-1191
Get access

Abstract

Solid state interfacial reactions of Ti3Al with Si3N4 and SiC have been studied via both bulk and thin film diffusion couples at temperatures of 1000 and 1200 °C. The nature of reactions of Ti3Al with Si3N4 and SiC was found to be similar. Only limited reactions were detected in samples reacted at 1000 °C. In the Ti3Al/Si3N4, layered reaction products consisting of mainly titanium silicide(s), titanium-silicon-aluminide, and titanium-silicon-nitride were formed; in the Ti3Al/SiC, the reaction product was primarily titanium-silicon-carbide. In both cases, silicon was enriched near the surface region, and aluminum was depleted from the reacted region. Reactions at 1200 °C resulted in a drastic change of the Si distribution profiles; the enrichment of Si in near surface regions was no longer observed, and the depletion of Al became more extensive. Titanium nitride and titanium-silicon-carbide were the major reaction products in the Ti3Al/Si3N4 and Ti3Al/SiC reactions, respectively. Mechanisms of driving the variation of Si, N, and C diffusion behavior (as a function of temperature) and the depletion of Al from the diffusion zone are suggested. It is proposed that reactions of Ti3Al with Si3N4 and SiC lead to in situ formation of a diffusion barrier, which limits the diffusion kinetics and further reaction. The thermodynamic driving force for the Ti3Al/Si3N4 reactions is discussed on the basis of Gibbs free energy.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 5 , May 1992 , pp. 1253 - 1265
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Lipsitt, H. A., in High-Temperature Ordered Intermetallic Alloys, edited by Koch, C. C., Liu, C. T., and Stoloff, N. S. (Mater. Res. Soc. Symp. Proc. 39, Pittsburgh, PA, 1985), p. 351.Google Scholar
2.Smith, P. R. and Froes, F. H., J. Metals 36, 19 (1984).Google Scholar
3.Smialek, J., Gedwill, M. A., and Brindley, P. K., Scripta Metall. et Mater. 24, 1291 (1990).CrossRefGoogle Scholar
4.Yang, J. M. and Jeng, S. M., J. Metals 56 (1989).CrossRefGoogle Scholar
5.Yang, J. M. and Jeng, S. M., Scripta Metall. et Mater. 23, 1559 (1989).CrossRefGoogle Scholar
6.Baumann, S. F., Brindley, P. K., and Smith, S. D., Metall. Trans. 21A, 1559 (1990).CrossRefGoogle Scholar
7.Das, G., Metall. Trans. 21A, 1571 (1990).CrossRefGoogle Scholar
8.Rhodes, C. G., Vassiliou, M. S., Mitchell, M. R., and Spurling, R. A., Metall. Trans. 21A 1589 (1990).CrossRefGoogle Scholar
9.Martineau, P., Pailler, R., Lahaye, M., and Naslain, R., J. Mater.Sci. 19, 2749 (1984).CrossRefGoogle Scholar
10.Ratliff, J. L. and Powell, G. W., AFML Techn. Report 70–42 (U. S. Dept. of Commerce, Nat. Tech. Inf. Ser., Springfield, VA, 1970).Google Scholar
11.House, L. J., Thesis, George Washington University, Washington, DC (May 1979).Google Scholar
12.Sastry, S. M. L. and Lipsitt, H. A., Metall. Trans. 8A, 1543 (1977).CrossRefGoogle Scholar
13.Chou, T. C., unpublished research.Google Scholar
14.Davis, L. E., MacDonald, N. C., Palmberg, P. W., Riach, G. E., and Weber, R. E., Handbook of Auger Electron Spectroscopy, 2nd ed. (Perkin-Elmer Corporation, Eden Prairie, MN, 1978), pp. 31 & 47.Google Scholar
15.Binary Alloy Phase Diagrams, edited by Massalski, T. B., Murray, J. L., Bennett, L.H., and Baker, H. (ASM, Metals Park, OH, 1986), vol. I and II.Google Scholar
16.Wagner, C. D., Riggs, W. M., Davis, L. E., and Moulder, J. F., Handbook of X-Ray Photoelectron Spectroscopy, edited by Muilenberg, G. E. (Perkin-Elmer Corporation, Eden Prairie, MN, 1978), pp. 50–68.Google Scholar
17.Goldstein, J. I., Newbury, D. E., Echlin, P., Joy, D. C., and Lifshin, E., Scanning Electron Microscopy and X-ray Microanalysis (Plenum Press, New York, 1981), p. 440.CrossRefGoogle Scholar
18.Butz, R., Rubloff, G. W., Tan, T. Y., and Ho, P. S., Phys. Rev. B 30, 5421 (1984).CrossRefGoogle Scholar
19.Holloway, K. and Sinclair, R., J. Appl. Phys. 61, 1359 (1987).CrossRefGoogle Scholar
20.Kubaschewski, O. and Alcock, C. B., Metallurgical Thermochem-Istry, 5th ed. (Pergamon Press, New York, 1979), pp. 358 – 372.Google Scholar
21.Kubaschewski, O. and Alcock, C. B., Metallurgical Thermochemistry, 5th ed. (Pergamon Press, New York, 1979), pp. 382–383.Google Scholar
22.Barin, I., Knacke, O., and Kubaschewski, O., Thermochemical Properties of Inorganic Substances (Springer, New York, 1977), pp. 752–790.CrossRefGoogle Scholar
23.De Boer, F. R., Boom, R., Mattens, W. C. M., Miedema, A. R., and Niessen, A. K., Cohesion in Metals Transition Metal Alloys (North-Holland, New York, 1988), pp. 126–142.Google Scholar
24.Samokhval, V. V., Poleshchuk, P. A., and Vecher, A. A., Russ. J. Phys. Chem. 45, 1174 (1971).Google Scholar