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Photochemical modification of polytetrafluoroethylene into oleophilic property using an ArF excimer laser

Published online by Cambridge University Press:  31 January 2011

M. Okoshi ,
M. Murahara  and
K. Toyoda
M. Okoshi
Affiliation:
Department of Electrical Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-12, Japan
M. Murahara
Affiliation:
Department of Electrical Engineering, Tokai University, 1117 Kitakaname, Hiratsuka, Kanagawa 259-12, Japan
K. Toyoda
Affiliation:
Riken, Institute of Physical and Chemical Research, 2-1 Hirosawa, Wako, Saitama 351-01, Japan
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Abstract

Photochemical modification of the polytetrafluoroethylene (PTFE) with incorporation of the CH3 radical released from the B(CH3)3 molecule excited by an ArF excimer laser has been demonstrated. The incorporation of CH3 radicals and the depletion of fluorine atoms of the polymer surface were studied by XPS analysis and infrared ATR spectrum measurement. In these photochemical reactions, the photoirradiated surface changed into oleophilic. The properties were studied by contact angle measurement. The stability of the oleophilic surface was examined at the elevated temperature of 200 °C for 6 h in O2 or N2 ambient and also by immersing in alkaline or acid water solutions.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 7 , July 1992 , pp. 1912 - 1916
Copyright
Copyright © Materials Research Society 1992

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References

1.Phillips, H., Sauerbrey, R., Callahan, D., Szabo, G., and Bor, Z., CLEO'91 CFF6, 510 (1991).Google Scholar
2.Niino, H. and Yabe, A., CLEO'91 CWFS7, 286 (1991).Google Scholar
3.Okoshi, M., Murahara, M., and Toyoda, K., in In-Situ Patterning: Selective Area Deposition and Etching, edited by Bernhardt, A. F., Black, J. G., and Rosenberg, R. (Mater. Res. Soc. Symp. Proc. 158, Pittsburgh, PA, 1990), p. 33.Google Scholar
4.Nelson, E. R., Kilduff, T. J., and Benderly, A. A., Ind. Eng. Chem. 50, 329 (1958).CrossRefGoogle Scholar
5.Jansta, J., Dousek, F. P., and Patzelova, V., Carbon 13, 377 (1975).CrossRefGoogle Scholar