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Novel yttrium-stabilized zirconia polymeric precursor for the fabrication of thin films

Published online by Cambridge University Press:  03 March 2011

Roger M. Smith ,
Xiao-Dong Zhou ,
Wayne Huebner  and
Harlan U. Anderson
Roger M. Smith
Affiliation:
Department of Ceramic Engineering, Electronic Materials Appplied Research Center, University of Missouri-Rolla, Rolla, Missouri 65401
Xiao-Dong Zhou*
Affiliation:
Department of Ceramic Engineering, Electronic Materials Appplied Research Center, University of Missouri-Rolla, Rolla, Missouri 65401
Wayne Huebner
Affiliation:
Department of Ceramic Engineering, Electronic Materials Appplied Research Center, University of Missouri-Rolla, Rolla, Missouri 65401
Harlan U. Anderson
Affiliation:
Department of Ceramic Engineering, Electronic Materials Appplied Research Center, University of Missouri-Rolla, Rolla, Missouri 65401
*
a)Address all correspondence to this author. e-mail: zhou@umr.edu
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Abstract

An acetate-based polymeric precursor for producing yttrium-stabilized zirconia (YSZ) was developed. The precursor was prepared under ambient conditions and contains only yttrium and zirconium cations. Dense, crack-free films were fabricated with this precursor on alumina substrates at a rate of 60 nm per deposition, producing polycrystalline YSZ at temperatures as low as 600 °C. Grain growth in thin YSZ films followed Arrhenius equation with an activation energy approximately 0.45 eV. The residual strain in YSZ films decreased with increasing annealing temperature from 600 to 900 °C.

Keywords

Thin filmCoating
Type
Articles
Information
Journal of Materials Research , Volume 19 , Issue 9 , September 2004 , pp. 2708 - 2713
Copyright
Copyright © Materials Research Society 2004

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