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Microstructures and interdiffusions of Pt/Ti electrodes with respect to annealing in the oxygen ambient

Published online by Cambridge University Press:  03 March 2011

Kyu Ho Park ,
Cha Yeon Kim ,
Young Woo Jeong ,
Hyun Ja Kwon ,
Kwang Young Kim ,
Jeong Soo Lee  and
Sung Tae Kim
Kyu Ho Park
Affiliation:
GoldStar Central Research Laboratory, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
Cha Yeon Kim
Affiliation:
GoldStar Central Research Laboratory, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
Young Woo Jeong
Affiliation:
GoldStar Central Research Laboratory, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
Hyun Ja Kwon
Affiliation:
GoldStar Central Research Laboratory, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
Jeong Soo Lee
Affiliation:
GoldStar Central Research Laboratory, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
Sung Tae Kim
Affiliation:
GoldStar Central Research Laboratory, 16 Woomyeon-dong, Seocho-gu, Seoul 137-140, Korea
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Abstract

The microstructural variation and the interdiffusion of Pt (80 nm)/Ti (70 nm)/SiO2/Si during annealing in O2 were investigated using Auger electron spectroscopy, x-ray diffraction, transmission electron microscopy, and scanning electron microscopy. While the as-deposited and 400 °C annealed samples showed well-defined layer structures without any significant interfacial reaction, the degree of oxidation remarkably increased with increasing temperature above 500 °C. The PtTi alloy phase with Pmma structure (AuCd type) was observed from the 500 °C annealed sample. Drastic interdiffusion occurring above 600 °C changed the Pt/Ti bilayer into a very entangled structure. Some TiO2 phases were exposed to the ambient between Pt hillocks. In addition, a small amount of Pt-silicide was found near the TiOx/SiO2 interface.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 7 , July 1995 , pp. 1790 - 1794
Copyright
Copyright © Materials Research Society 1995

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