Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-01T21:28:53.976Z Has data issue: false hasContentIssue false

Formation mechanisms and atomic configurations of nitride phases at the interface of aluminum nitride and titanium

Published online by Cambridge University Press:  31 January 2011

Chia-Hsiang Chiu
Affiliation:
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30050, Taiwan
Chien-Cheng Lin*
Affiliation:
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30050, Taiwan
*
a)Address all correspondence to this author. e-mail: chienlin@faculty.nctu.edu.tw
Get access

Abstract

Aluminum nitride was bonded with a titanium foil at 1400 °C for up to 1 h in Ar. The AlN/Ti interfacial reactions were investigated using analytical electron microscopy. Reaction layers, consisting of δ-TiN, τ2-Ti2AlN, γ-TiAl, α2-Ti3Al, a two-phase region (α2-Ti3Al + α-Ti), and α-Ti (Al, N) solid solution, were observed after annealing at 1400 °C for 0.1 h. Among these phases, the α2-Ti3Al and (α2-Ti3Al + α-Ti) were formed during cooling. Further diffusion of N atoms into the reaction zone precipitates a chopped fiber-like α2-Ti2AlN in the matrix of γ-TiAl, with [110]γ−TiAl//[11¯20]τ2−Ti2AlN and (1¯1¯1)γ−TiAl//(1¯10¯3)τ2−Ti2AlN, by substituting N atoms for one-half Al atoms after annealing at 1400 °C for 1 h. The released Al atoms, due to the precipitation of τ2-Ti2AlN, resulted in an ordered Al-rich γ-TiAl or Ti3Al5. Furthermore, the α-Ti (Al, N) was nitridized into a lamellar layer (δ-TiN + α-Ti) with [110]δ−TiN//[11¯20]α−Ti and (111)δ−TiN//(0001)α−Ti.

Type
Articles
Copyright
Copyright © Materials Research Society 2008

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Paransky, Y., Berner, A., Gotman, I.: Microstructure of reaction zone at the Ti-AlN interface. Mater. Lett. 40, 180 1999CrossRefGoogle Scholar
2Paransky, Y., Gotman, I., Gutmanas, E.Y.: Reactive phase formation at AlN–Ti and AlN–TiAl interfaces. Mater. Sci. Eng., A 277, 83 2000CrossRefGoogle Scholar
3Paransky, Y., Klinger, L., Gotman, I.: Kinetics of two-phase layer growth during reactive diffusion. Mater. Sci. Eng., A 270, 231 1999CrossRefGoogle Scholar
4Paransky, Y., Berner, A., Gotman, I., Gutmanas, E.: Phase recognition in AlN–Ti system by energy dispersive spectroscopy and electron backscatter diffraction. Mikrochim. Acta 134, 171 2000CrossRefGoogle Scholar
5Pinkas, M., Frage, N., Froumin, N., Pelleg, J., Dariel, M.P.: Early stages of interface reactions between AlN and Ti thin films. J. Vac. Sci. Technol. 20, 887 2002CrossRefGoogle Scholar
6Nakahata, S., Sogabe, K., Matsuura, T., Yamakawa, A.: One role of titanium compound particles in aluminum nitride sintered body. J. Mater. Sci. 32, 1873 1997CrossRefGoogle Scholar
7Imanaka, Y., Notis, M.R.: Interfacial reaction between titanium thin films and aluminum nitride substrates. J. Am. Ceram. Soc. 82, 1547 1999CrossRefGoogle Scholar
8Yasumoto, T., Amakawa, K., Iwase, N., Shinsawa, N.: Reaction between AlN and metal thin films during high temperature annealing. J. Ceram. Soc. Jpn. 101, 969 1993CrossRefGoogle Scholar
9El-Sayed, M.H., Naka, M., Schuster, J.C.: Interfacial structure and reaction mechanism of AlN/Ti joints. J. Mater. Sci. 32, 2715 1997CrossRefGoogle Scholar
10Chiu, C.H., Lin, C.C.: Microstructural characterization and phase development at the interface between aluminum nitride and titanium after annealing at 1300°–1500 °C. J. Am. Ceram. Soc. 89, 1409 2006CrossRefGoogle Scholar
11Zhao, B., Sun, J., Wu, J.S., Yuan, Z.X.: Gas nitriding behavior of TiAl based alloys in an ammonia Atmosphere. Scr. Mater. 46, 581 2002CrossRefGoogle Scholar
12Tian, W.H., Nemoto, M.: Precipitation behavior of nitrides in L10-ordered TiAl. Intermetallics 13, 1030 2005CrossRefGoogle Scholar
13Pivin, J.C., Zheng, P., Ruault, M.O.: Transmission electron microscopy investigation of the structural transformations in titanium or TiAl implanted with nitrogen, carbon, oxygen and boron. Mater. Sci. Eng., A 115, 83 1989CrossRefGoogle Scholar
14Kloosterman, A.B., Hosson, J.T.M.D.: Microstructural characterization of laser nitrided titanium. Scr. Metall. Mater. 33, 567 1995CrossRefGoogle Scholar
15Saito, K., Matsushima, T.: Nitrogen ion implantation into the intermetallic compound TiAl. Mater. Sci. Eng., A 115, 355 1989CrossRefGoogle Scholar
16Cliff, G., Lorimer, G.W.: The quantitative analysis of thin specimens. J. Microsc. 103, 203 1975CrossRefGoogle Scholar
17Chen, Q., Sundman, B.: Thermodynamic assessment of the Ti–Al–N system. J. Phase Equilib. 19, 146 1998CrossRefGoogle Scholar
18Murray, J.L.: Phase Diagrams of Binary Titanium Alloys ASM International Metals Park, OH 1987Google Scholar
19Inoue, M., Nunogaki, M., Suganuma, K.: Chemical reaction of TiAl intermetallics with a nitrogen plasma. J. Solid State Chem. 157, 339 2001CrossRefGoogle Scholar
20Villars, P., Calvert, L.D.: Pearson’s Handbook of Crystallographic Data for Intermetallic Phases ASM International Materials Park, OH 1991Google Scholar
21Doi, M., Koyama, T., Taniguchi, T., Naito, S.: Morphological changes of the Ti3Al5 phase formed by phase-decomposition of TiAl intermetallics. Mater. Sci. Eng., A 329–331, 891 2002CrossRefGoogle Scholar
22Sattonnay, G., Dimitrov, O.: Long-range order relaxation and phase transformation in γ-TiAl alloys. Acta Mater. 47, 2077 1999CrossRefGoogle Scholar
23Nakano, T., Negishi, A., Hayashi, K., Umakoshi, Y.: Ordering process of Al5Ti3, h-Al2Ti and r-Al2Ti with f.c.c.-based long-period superstructures in rapidly solidified Al-rich TiAl alloys. Acta Mater. 47, 1091 1999CrossRefGoogle Scholar
24Fu, C.L., Yoo, M.H.: Bonding mechanisms and point defects in TiAl. Intermetallics 1, 59 1993CrossRefGoogle Scholar
25Swaminathan, S., Jones, I.P., Johnson, A.W.S., Fraser, H.L.: Debye–Waller factors in off-stoichiometric TiAl: Effect of ordering of excess Al atoms on Ti sites. Philos. Mag. Lett. 73, 319 1996CrossRefGoogle Scholar
26Vujic, D., Li, Z., Whang, S.H.: Effect of rapid solidification and alloying addition on lattice distortion and atomic ordering in L10 TiAl alloys and their ternary alloys. Metall. Trans. A 19, 2445 1988CrossRefGoogle Scholar
27Lu, W., Chen, C.L., Wang, F.H., Lin, J.P., Chen, G.L., He, L.L.: Phase transformation in the nitride layer during the oxidation of TiAl-based alloys. Scripta Mater. 56, 773 2007CrossRefGoogle Scholar
28Yu, R., Zhang, S., He, L.L., Wu, W.T., Ye, H.Q.: Metal/ceramic interface in an in situ synthesized Ti/TiCP composite coating by laser processing. J. Mater. Res. 16, 9 2001CrossRefGoogle Scholar
29Lin, Z.J., Zhuo, M.J., Zhou, Y.C., Li, M.S., Wang, J.Y.: Microstructural characterization of layered ternary Ti2AlC. Acta Mater. 54, 1009 2006CrossRefGoogle Scholar