Hostname: page-component-5c6d5d7d68-lvtdw Total loading time: 0 Render date: 2024-08-16T14:53:27.575Z Has data issue: false hasContentIssue false

Electronic excitation induced controlled modifications of semiconductor-to-metal transition in epitaxial VO2 thin films

Published online by Cambridge University Press:  06 December 2011

Alok Gupta*
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695
Rahul Singhal
Affiliation:
Inter University Accelerator Center, New Delhi 110067, India
Jagdish Narayan
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695
Devesh K. Avasthi
Affiliation:
Inter University Accelerator Center, New Delhi 110067, India
*
a)Address all correspondence to this author. e-mail: agupta10@ncsu.edu
Get access

Abstract

We report controlled modifications in the semiconductor-to-metal transition characteristics of VO2 single-crystal thin films induced by swift heavy ion (SHI) irradiation with varying ion fluences. At very high energies of ions (200 MeV Au), the electronic stopping (∼2009 eV/Å) dominates over nuclear stopping (∼16 eV/Å). Under these extreme electronic excitation conditions caused by electronic stopping and the passage of SHIs through the entire thickness of the film, creation of certain unique type of defects and disordered regions occurs. X-ray diffraction, Raman spectroscopy, infrared transmission spectroscopy, x-ray photoelectron spectroscopy (XPS), and electrical measurements were performed to investigate the characteristics and role of these defects on structural, optical, and electrical properties of VO2 thin films. XPS and electrical resistivity measurements suggest that the ion irradiation induces localized defect states that appear to correlate well with the creation of disordered regions in the VO2 thin films. The high-energy heavy-ion irradiation changes the transition characteristics drastically from a first-order to a second-order transition (electronic—Mott type). The low-temperature conductance data for these ion-irradiated films fit well with the quasiamorphous model for resistivity of VO2, where ion irradiation is believed to create mid-bandgap defect states.

Type
Articles
Copyright
Copyright © Materials Research Society 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Morin, F.J.: Oxides which show a metal-to-insulator transition at the Neel temperature. Phys. Rev. Lett. 3, 34 (1959).CrossRefGoogle Scholar
2.Nag, J. and Haglund, R.F. Jr.: Synthesis of vanadium dioxide thin films and nanoparticles. J. Phys. Condens. Matter. 20, 264016 (2008).CrossRefGoogle Scholar
3.Narayan, J. and Bhosle, V.: Phase transition and critical issues in structure-property correlations of vanadium oxide. J. Appl. Phys. 100, 103524 (2006).CrossRefGoogle Scholar
4.Griffiths, C.H. and Eastwood, H.K.: Influence of stoichiometry on metal–semiconductor transition in vanadium dioxide. J. Appl. Phys. 45, 2201 (1974).CrossRefGoogle Scholar
5.Yang, T-H., Aggarwal, R., Gupta, A., Zhou, H., Narayan, R.J., and Narayan, J.: Semiconductor-metal transition characteristics of VO2 thin films grown on c- and r-sapphire substrates. J. Appl. Phys. 107, 053514 (2010).CrossRefGoogle Scholar
6.Gupta, A., Aggarwal, R., Gupta, P., Dutta, T., Narayan, R.J., and Narayan, J.: Semiconductor to metal transition characteristics of VO2 thin films grown epitaxially on Si (001). Appl. Phys. Lett. 95, 11915 (2009).CrossRefGoogle Scholar
7.Case, F.C.: Modifications in the phase transition properties of predeposited VO2 films. J. Vac. Sci. Technol. A 2(4), 1509 (1984).CrossRefGoogle Scholar
8.Case, F.C.: Effects of low‐energy low‐flux ion bombardment on the properties of VO2 thin films. J. Vac. Sci. Technol. A 7(3), 1194 (1989).CrossRefGoogle Scholar
9.Leone, A., Trione, A.M., and Junga, F.: Alteration in electrical and infrared switching properties of vanadium oxides due to proton irradiation. IEEE Trans. Nucl. Sci. 37(6), 1739 (1990).CrossRefGoogle Scholar
10.Lin, L-B., Lu, T-C., Liu, Q., Lu, Y., and Feng, X-D.: Phase-transition properties of VO2 thin films changed by high flux electron beam radiation. Surf. Coat. Technol. 158159, 530 (2002).CrossRefGoogle Scholar
11.Nastasi, M.A., Mayer, J.W., and Hirvonen, J.K.: Ion-Solid Interactions: Fundamentals and Applications (Cambridge University Press, Cambridge, England, 1996), p. 141.CrossRefGoogle Scholar
12.Ziegler, J.F., Biersack, P., and Littmark, U.: Stopping and Ranges of Ions in Matter (Pergamon, New York, 1985).CrossRefGoogle Scholar
13.Toulemonde, M., Constantini, J.M., Dufour, C., Meftah, A., Paumier, E., and Studer, F.: Track creation in SiO. Nucl. Instrum. Methods Phys. Res. B 116, 37 (1996).CrossRefGoogle Scholar
14.Avasthi, D.K., Assmann, W., Notle, H., Mieskes, H.D., Ghosh, S., and Mishra, N.C.: Transport of oxygen atoms mediated by electronic excitation. Nucl. Instrum. Methods Phys. Res. B 166, 345 (2000).CrossRefGoogle Scholar
15.Schilbe, P.: Raman scattering in VO2. Physica B 316, 600 (2002).CrossRefGoogle Scholar
16.Nishida, K., Osada, M., Takeuchi, H., Yosiaki, I., Sakai, J., Ito, N., Ikariyama, R., Kamo, T., Fujisawa, T., Funakubo, H., Katoda, T., and Yamamoto, T.: Raman spectroscopy study of oxygen vacancies in PbTiO3 thin films generated heat-treated in hydrogen atmosphere. Jpn. J. Appl. Phys. 47, 7510 (2008).CrossRefGoogle Scholar
17.Parker, J.C.: Raman scattering from VO2 single crystals: A study of the effects of surface oxidation. Phys. Rev. B 42(5), 3164 (1990).CrossRefGoogle ScholarPubMed
18.Moshfegh, A.Z. and Ignatiev, A.: Formation and characterization of thin film vanadium oxides: Auger electron spectroscopy, x-ray photoelectron spectroscopy, x-ray diffraction, scanning electron microscopy, and optical reflectance studies. Thin Solid Films 198, 251 (1991).CrossRefGoogle Scholar
19.Sawatzky, G.A. and Post, D.: X-ray photoelectron and Auger spectroscopy study of some vanadium oxides. Phys. Rev. B 20, 1546 (1979).CrossRefGoogle Scholar
20.Klimov, V.A., Timofeeva, I.O., Khanin, S.D., Shadrin, E.B., Il’inskiÏ, A.V., and Silva-Andrade, F.: Effect of crystallization of amorphous vanadium dioxide films on the parameters of a semiconductor-metal phase transition. Semiconductors 37, 370 (2003).CrossRefGoogle Scholar
21.Ko, C. and Ramanathan, S.: Observation of electric field-assisted phase transition in thin film vanadium oxide in a metal-oxide-semiconductor device geometry. Appl. Phys. Lett. 93, 252101 (2008).CrossRefGoogle Scholar
22.Von Schulthess, G. and Wachter, P.: First observation of photoconductivity in the semiconducting phase of VO2. Solid State Commun. 15, 1645 (1974).CrossRefGoogle Scholar