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Efficiency of methane and acetylene in forming diamond by microwave plasma assisted chemical vapor deposition

Published online by Cambridge University Press:  31 January 2011

Curtis E. Johnson
Affiliation:
Chemistry Division, Research Department, Naval Air Warfare Center, Weapons Division, China Lake, California 93555-6001
Wayne A. Weimer
Affiliation:
Chemistry Division, Research Department, Naval Air Warfare Center, Weapons Division, China Lake, California 93555-6001
Frank M. Cerio
Affiliation:
Chemistry Division, Research Department, Naval Air Warfare Center, Weapons Division, China Lake, California 93555-6001
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Abstract

Diamond films were grown by microwave plasma assisted chemical vapor deposition using mixtures of 1% 13CH4 and 0.5% 12C2H2 in H2, and stable gaseous products were analyzed by mass spectrometry. The major gaseous products are methane and acetylene, and scrambling of the 13C label can be controlled at relatively high gas flow rates. At the highest flow rate studied a diamond film was grown with 77% 13C incorporation, while the methane in the reactor exhaust gas at this flow rate contained 83% 13C. By comparing gaseous 13C compositions with that of the films, the efficiency of diamond growth from methane (possibly via the methyl radical) is estimated to be about ten times higher than that for acetylene.

Type
Articles
Copyright
Copyright © Materials Research Society 1992

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References

1.Harris, S. J. and Martin, L. R., J. Mater. Res. 5, 2313 (1990), and References therein. This paper briefly reviews the literature.CrossRefGoogle Scholar
2.Chu, C. J., D'Evelyn, M. P., Hauge, R. H., and Margrave, J. L., J. Mater. Res. 5, 2405 (1990).CrossRefGoogle Scholar
3.Goodwin, D. G. and Gavillet, G. G., J. Appl. Phys. 68, 6393 (1990).CrossRefGoogle Scholar
4.Frenklach, M. and Wang, H., Phys. Rev. B 43, 1520 (1991).CrossRefGoogle Scholar
5.Chu, C. J., D'Evelyn, M. P., Hauge, R. H., and Margrave, J. L., J. Appl. Phys. 70, 1695 (1991).CrossRefGoogle Scholar
6.Yarbrough, W. A., Tankala, K., and DebRoy, T., in New Diamond Science and Technology, edited by Messier, R., Glass, J. T., Butler, J. E., and Roy, R. (Mater. Res. Soc. Int. Symp. Proc. NDST-2, Pittsburgh, PA, 1991), p. 341.Google Scholar
7.Martin, L. R. and Hill, M. W., J. Mater. Sci. Lett. 9, 621 (1990).CrossRefGoogle Scholar
8.Weimer, W. A., Cerio, F. M., and Johnson, C. E., J. Mater. Res. 6, 2134 (1991).CrossRefGoogle Scholar
9.Johnson, C. E., Weimer, W. A., and Harris, D. C., Mater. Res. Bull. XXIV, 1127 (1989).CrossRefGoogle Scholar
10.Banholzer, W. F. and Anthony, T. R., Thin Solid Films (in press).Google Scholar
11.D'Evelyn, M. P., Chu, C. J., Hauge, R. H., and Margrave, J. L., J. Appl. Phys. 71, 1528 (1992).CrossRefGoogle Scholar
12.Warnatz, J., in Combustion Chemistry, edited by Gardiner, W. C., Jr. (Springer-Verlag, New York, 1984), p. 203.Google Scholar
13. The assumption of a first order rate dependence in Eq. (1) appears to be reasonable based on results from two kinetic studies using hot filament reactors. Kweon, D. W., Lee, J. Y., and Kim, D., J. Appl. Phys. 69, 8329 (1991); S. J. Harris, A. M. Weiner, and T. A. Perry, J. Appl. Phys. 70, 1385 (1991).CrossRefGoogle Scholar