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Effect of various deposition parameters on the co-deposition behavior of cobalt antimony in citric-based solution

Published online by Cambridge University Press:  31 January 2011

H. Cheng ,
H.H. Hng ,
J. Ma  and
X.J. Xu
H. Cheng*
Affiliation:
School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798
H.H. Hng*
Affiliation:
School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798
J. Ma
Affiliation:
School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798
X.J. Xu
Affiliation:
Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, United Kingdom
*
a)Address all correspondence to these authors. e-mail: Hcheng@pmail.ntu.edu.sg
b)Address all correspondence to these authors. e-mail: ASHHHng@ntu.edu.sg
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Abstract

Direct current (dc) electrodeposition was used to co-deposit cobalt and antimony in citric-based solutions. Growth behavior of Co–Sb alloy thin films was systematically studied under various deposition conditions. Effects of deposition parameters (i.e., deposition potential, cobalt sulfate concentration, and pH value) on the microstructure, chemical, and phase composition of the deposited materials were also studied and are discussed in detail.

Keywords

Chemical compositionElectrodepositionMorphology
Type
Articles
Information
Journal of Materials Research , Volume 23 , Issue 11 , November 2008 , pp. 3013 - 3020
Copyright
Copyright © Materials Research Society 2008

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References

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