Hostname: page-component-84b7d79bbc-g7rbq Total loading time: 0 Render date: 2024-07-25T22:39:14.999Z Has data issue: false hasContentIssue false

Creep-controlled Diffusional Hillock Formation in Blanket Aluminum Thin Films as a Mechanism of Stress Relaxation

Published online by Cambridge University Press:  31 January 2011

Deok-Kee Kim
Affiliation:
Center for Integrated Systems, Stanford University, Stanford, California 94305
William D. Nix
Affiliation:
Center for Integrated Systems, Stanford University, Stanford, California 94305
Michael D. Deal
Affiliation:
Center for Integrated Systems, Stanford University, Stanford, California 94305
James D. Plummer
Affiliation:
Center for Integrated Systems, Stanford University, Stanford, California 94305
Get access

Abstract

Hillock formation, a stress-induced diffusional relaxation process, was studied in sputter-deposited Al films. The grain sizes in these films were small compared to those in other sputter-deposited Al films, and impurities (O, Ti, W) were incorporated during the preparation of the films. Stress and hardness measurements both indicate that the Al films were strengthened by the small grain size and incorporated impurities. We observed a new type of hillock in these Al thin films after annealing for 2 h at 450 °C in a forming gas ambient. The hillocks were composed of large Al grains created between the substrate and the original Al film with its columnar grain structure, apparently by diffusion from the surrounding area. By modifying the boundary conditions of Chaudhari's hillock formation model [P. Chaudhari, J. Appl. Phy. 45, 4339 (1974)], we have created a new model that can describe the experimentally observed hillocks. Our model seems to explain the experimentally observed abnormal hillock formation and may be applied to other types of hillock formation using different creep laws.

Type
Articles
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Chaudhari, P., J. Appl. Phys. 45, 4339 (1974).CrossRefGoogle Scholar
2.Chang, C.Y. and Vook, R.W., Thin Solid Films 228, 205 (1993).CrossRefGoogle Scholar
3.Gerth, D., Datzer, D., and Schwarzer, R., Mater. Sci. Forum 94–96, 557 (1992).CrossRefGoogle Scholar
4.Iwamura, E., Ohnishi, T., and Yoshikawa, K., Thin Solid Films 270, 450 (1995).CrossRefGoogle Scholar
5.Bacconnier, B., Lormand, G., Papapietro, M., Achard, M., and Papon, A-M., J. Appl. Phys. 64, 6483 (1988).CrossRefGoogle Scholar
6.Venkatraman, R., Chen, S., and Bravman, J.C., J. Vac. Sci. Technol. A 9, 2536 (1991).CrossRefGoogle Scholar
7.Genin, F.Y. and Siekhaus, W.J., J. Appl. Phys. 79, 3560 (1996).CrossRefGoogle Scholar
8.Zielinski, E.M., Ph.D. Dissertation, Standard University, Stanford, CA (1995).Google Scholar
9.Griffin, A.J. Jr, Brotzen, F.R., and Dunn, C.F., Thin Solid Films 150, 237 (1987).CrossRefGoogle Scholar
10.Venkatraman, R. and Bravman, J.C., J. Mater. Res. 7, 2040 (1992).CrossRefGoogle Scholar
11.Griffin, A.J. Jr, Brotzen, F.R., and Dunn, C., Scr. Metall. 20, 1271 (1986).CrossRefGoogle Scholar
12.Venkatraman, R., Ph.D. Dissertation, Stanford University, Stanford, CA (1992).Google Scholar
13.Besser, P.R., Bader, S., Venkatraman, R., and Bravman, J.C., in Materials Reliability in Microelectrnics III, edited by Rodbell, K.P., Filter, W.F., Frost, W.J., and Ho, P.S. (Mater. Res. Soc. Symp. Proc. 309, Pittsburgh, PA, 1993), p. 255.Google Scholar
14.Kim, D-K., Heiland, B., Nix, W.D., Arzt, E., Deal, M.D., and Plummer, J.D., in Microstructure of Thermal Hillocks on Blanket Al Thin Films, Thin Solid Films (August, 2000).CrossRefGoogle Scholar
15.Thouless, M.D., Rodbell, K.P., and Cabral, C. Jr, J. Vac. Sci. Technol. A 14, 2454 (1996).CrossRefGoogle Scholar
16.Hamilton, C.H., Bampton, C.C., and Paton, N.E., in Superplastic Forming of Structural Alloys, edited by Paton, N.E. and Hamilton, C.H., Conference Proceedings of the Metallurgical Society of AIME (AIME, New York, 1982), p. 173.Google Scholar
17.Frost, H.J. and Ashby, M.F., Deformation-Mechanism Maps (Pergamon Press, Elmsford, NY, 1982), p. 21.Google Scholar