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Control of porosity in fluoride thin films prepared by vapor deposition

Published online by Cambridge University Press:  31 January 2011

Hakkwan Kim  and
Alexander H. King
Hakkwan Kim*
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907-2044
Alexander H. King
Affiliation:
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907-2044
*
a)Address all correspondence to this author. e-mail: kim87@purdue.edu
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Abstract

We have measured the porosity in thin films of lithium fluoride (LiF), magnesium fluoride (MgF2), barium fluoride (BaF2), and calcium fluoride (CaF2) as a function of the substrate temperature for films deposited by thermal evaporation onto glass substrates. The amount of porosity in the thin films was measured using an atomic force microscope and a quartz crystal thickness monitor. The porosity was very sensitive to the substrate temperature and decreased as the substrate temperature increased. Consistent behavior was observed among all of the materials in this study.

Keywords

FilmPhysical vapor deposition (PVD)Porosity
Type
Articles
Information
Journal of Materials Research , Volume 22 , Issue 7 , July 2007 , pp. 2012 - 2016
Copyright
Copyright © Materials Research Society 2007

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References

REFERENCES

1Gao, C., Malmhäll, R. Chen, G.L.: Quantitative characterization of sputter-process-induced nano-voids and porous film state in magnetic thin films. IEEE Trans. Magn. 33, 3013 1997Google Scholar
2Chia, R.W.J., Wang, C.C. Lee, J.J.K.: Effect of adatom mobility and substrate finish on film morphology and porosity: Thin chromium film on hard disk. J. Magn. Magn. Mater. 209, 45 2000Google Scholar
3Lee, Y-Y., Heck, C., Chun, S-Y., Chayahara, A., Horino, Y., Ensinger, W. Enders, B.: Electrochemical porosity evaluation of thin films on iron base materials. Surf. Coat. Technol. 158/159, 588 2002Google Scholar
4Lee, Y-Y., Enders, B. Ensinger, W.: Determination of porosity of thin protective films on iron base materials and modelling of their development during aqueous corrosion. Thin Solid Films 459, 237 2004Google Scholar
5Leonhardt, M., Schneider, D., Kaspar, J. Schenk, S.: Characterizing the porosity in thin titanium films by laser-acoustics. Surf. Coat. Technol. 185, 292 2004CrossRefGoogle Scholar
6Saxena, R., Cho, W., Rodriguez, O., Gill, W.N. Plawsky, J.L.: Stability of thin copper films on mesoporous dielectrics. J. Non-Cryst. Solids 350, 14 2004CrossRefGoogle Scholar
7Cosset, F., Celerier, A., Barelaud, B. Vareille, J-C.: Thin reactive LiF films for nuclear sensors. Thin Solid Films 303, 191 1997CrossRefGoogle Scholar
8Nakahara, S.: Microporosity induced by nucleation and growth processes in crystalline and non-crystalline films. Thin Solid Films 45, 421 1977Google Scholar
9Fisher, D.J.: Halides diffusion-data compilation. Defect Diffus. Forum 181–182, 215 2000Google Scholar
10Movchan, B.A. Demchishin, A.V.: Study of the structure and properties of thick vacuum condensates of nickel, titanium, tungsten, aluminium oxide and zirconium dioxide. Phys. Met. Metallogr. 28(4), 83 1969Google Scholar