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Water Vapour and Carbon Dioxide Diffusion Resistances of Four Hevea brasiliensis Clonal Seedlings

Published online by Cambridge University Press:  03 October 2008

Zahar Samsuddin  and
Ivan Impens
Zahar Samsuddin
Affiliation:
Department of Biology, University Institute of Antwerp, Universiteitsplein, 1, B-2610 Wilrijk, Belgium
Ivan Impens
Affiliation:
Department of Biology, University Institute of Antwerp, Universiteitsplein, 1, B-2610 Wilrijk, Belgium
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Summary

Differences in the net photosynthetic rates of two classes of Hevea clonal seedlings are explained in terms of resistances to carbon dioxide diffusion from the outside air into the carboxylation sites. The residual resistance, the sum of the mesophyll and the carboxylation resistances, is apparently related to photosynthetic rates.

Type
Research Article
Information
Experimental Agriculture , Volume 14 , Issue 2 , April 1978 , pp. 173 - 177
Copyright
Copyright © Cambridge University Press 1978

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References

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