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X-Ray Reflection, A New Tool for Investigating Layered Structures and Interfaces

Published online by Cambridge University Press:  06 March 2019

Bruno Lengeler*
Affiliation:
Institut für Schicht- und lonentechnik Forschungszentrum Jülich GmbH Postfach 1913 D-5170 Jülich
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Abstract

At grazing incidence all X-ray techniques become surface sensitive. Far below the angle of total reflection the X-rays penetrate only 20 to 70 Å into condensed matter. X-ray reflectivity measurements give the density and the thickness of layers on substrates and the roughness of external and internal interfaces. The diffuse scattering in the vicinity of the specular reflection gives, besides the interface roughness, also the height-height correlation of the surface. From the angular dependence of the fluorescence intensity, emitted as a consequence of X-ray absorption, the depth profile of the absorbing species can be deduced. Artificial periodic multilayers give rise to Bragg reflexes and to standing X-ray wave fields, the angular dependence of which give the distribution of atomic species in the periodic stack. A number of examples illustrate the possibilities of the technique.

Type
III. Thin-Film and Surface Characterization by XRD
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

1. Eisenberger, P., Marra, W.C., Phys. Rev. Lett. 46, 1081 (1981).Google Scholar
2. Vineyard, G.H., Phys. Rev. B26, 4146 (1982).Google Scholar
3. Lengeler, B., X-ray absorption and reflection in the hard X-ray range, in “Photoemission and Absorption Spectroscopy of Solids and Interfaces with Synchrotron Radiation” eds. M. Campagna, K. Rosei, North Holland (1990).Google Scholar
4. Lengeler, B., Applications of X-ray absorption and reflection in materials science, in “X-ray absorption fine structure”, Ed. S.S. Hasnain, Ellis Horwood (1991).Google Scholar
5. Storb, C., Dedek, U., Weber, W., Lengeler, B., Schuster, M., Nucl. Instr. Meth. Phys. Res. (1991).Google Scholar
6. Stanglmeier, F., B, Lengeler, Weber, W., Göbel, H., Schuster, M., submitted to Acta Cryst.Google Scholar
7. Weber, W., Lengeler, B., unpublished.Google Scholar
8. Sinha, S.K., Sirota, E.B., Garoff, S., Stanley, H.B., Phys. Rev. B38, 2297 (1988).Google Scholar
9. Lengeler, B., Mikrochimica Acta 1, 455 (1987).Google Scholar
10. Zegenhagen, J., Materlik, G., Uhlhoff, W., J. X-ray Science and Technol. 2, 214 (1990).Google Scholar
11. Lengeler, B., X-ray absorption and reflection in materials science. Proceedings of the EPDIC 1 Munich, March 1991.Google Scholar