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Production Control of Gold and Rhodium Plating Thickness on Very Small Samples by X-Ray Spectroscopy

Published online by Cambridge University Press:  06 March 2019

George H. Glade*
Affiliation:
International Business Machines Corporation, Components Division Essex Junction, Vermont
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Abstract

Manufacture of reed switches, critical components in present-day dataprocessing support devices, requires a means of accurate, rapid analysis of elements used in plating tlie levers of the switch. Because of gready reduced feedback time, X-ray spectroscopy has replaced metallographic sectioning and optical measurement as a plating-thickness control method. While 6 hr were required to obtain thickness data for a given sample size by sectioning, X-ray spectroscopy requires only 2 hr, which permits better control of the plating operating. X-ray spectroscopy is now used routinely to control both gold and rhodium plating thicknesses in the 20- to 100μin. (1 × 10−6) thickness range. The large number of samples prevents long count duration, while the small sample size (0.110 by 0.033 in.) reduces the precision of the analysis. However, the precision of the X-ray and optical methods is approximately the same, 8% variance. X-ray accuracy is comparable to that of sectioning since the standards are obtained by sectioning. Simplicity of operation is required since relatively untrained operators are used. An aperture system is used to reduce background. The rhodium thickness measurement is obtained from gross rhodium intensity. Attenuation of gross nickel intensity from the base material was found to be a better measure of gold thickness intensity. Calibration for hoth gold and rhodium is performed by using the same wide detector conditions. The choice of analysis is made by changing only the 2θ angle, thus avoiding the time required for recalibration when changing analysis.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1967

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References

1. Heinrich, K. J. F., “X-Ray Probe with Collimation of the Secondary Beam,” in: W. M. Mueller (ed.), Advances in X-Ray Analysis, Vol. 5, Plenum Press, New York, 1962, p. 516.Google Scholar
2. Lloyd, J. C.. Department 255, International Business Machines Corp., Fishkill, New York, private communication.Google Scholar