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Depth Profiling Biaxial Stresses in Sputter Deposited Molybdenum Films; Use of the Cos2φ Method

Published online by Cambridge University Press:  06 March 2019

B. L. Ballard ,
P. K. Predecki ,
T. R. Watkins ,
K. J. Kozaczek ,
D. N. Braski  and
C. R. Hubbard
B. L. Ballard*
Affiliation:
University of Denver, Engineering Department, Denver, CO
P. K. Predecki
Affiliation:
University of Denver, Engineering Department, Denver, CO
T. R. Watkins
Affiliation:
HTML, Oak Ridge National Laboratory, Oak Ridge, TN
K. J. Kozaczek
Affiliation:
HTML, Oak Ridge National Laboratory, Oak Ridge, TN
D. N. Braski
Affiliation:
HTML, Oak Ridge National Laboratory, Oak Ridge, TN
C. R. Hubbard
Affiliation:
HTML, Oak Ridge National Laboratory, Oak Ridge, TN
*
*Present address: Rigaku/USA, 199 Rosewood Dr., Danvers, MA
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Abstract

Depth profiles of intrinsic in-plane, biaxial stresses were obtained as a function of τ, the 1/e penetration depth, in a 1.0 um thick planar d. c. magentron sputter deposited molybdenum film using asymmetric grazing incidence x-ray diffraction (GIXD). τ was varied between 20 and 276 Å. The stresses σ11 and σ22 were characterized in the directions parallel and perpendicular to the long axis of the cathode respectively using a cos2φ method. The results show that starting from τ=17Å, σ11 and σ22 are compressive and become rapidly more compressive with a minimum at τ ∼ 20 - 40 Å thereafter increasing gradually toward tensile values. The reasons for the shape of the stress gradient are not well understood but may be related to the relaxation of the stresses at the tops of the columnar Zone T-type microstructure and to the oxygen gradient in the film.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 363 - 370
Copyright
Copyright © International Centre for Diffraction Data 1995

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