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Characterization of TiN Film by XRD and XRF

Published online by Cambridge University Press:  06 March 2019

G. Kimmel ,
L. Politi  and
T. Wieder
G. Kimmel
Affiliation:
NRCN, P.O.Box 9001, Beer Sheva 84190, Israel Ben GurionUniversity of the Negev, Beer Sheva, Israel
L. Politi
Affiliation:
Ben GurionUniversity of the Negev, Beer Sheva, Israel
T. Wieder
Affiliation:
FH Furtwangen, 11 T, VS-Schwenningen, Germany
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Extract

TiAIN is a protective coating for cutting and reshaping tools, since it reduces wear, increases the cutting velocity of cutting tools, and increases the lifetime of reshaping tools. Thus many investigators studied the structure and properties of thin TiN films1-6. Due to the complicated geometry of the tools, the coating thickness may vary at different locations on a tool. For quality assurance thickness measurements are necessary. In this work-as a first step-only a simple geometry was considered.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 37: Forty-Second Annual Conference on Applications of X-ray Analysis, August 2-6, 1993 , 1993 , pp. 175 - 182
Copyright
Copyright © International Centre for Diffraction Data 1993

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References

1. Valvoda, V., Cerny, R. and Kuzel, R. JR., Dependence Microstrcture of TiN coating Oa their thickness, Thin Solid Films. 158: 233, (1988)Google Scholar
2. Valvoda, V., R., Kuzel JR. and R., Cerny, Structure of TiN coatings deposited at relatively high rates and low temperatures by magnetron sputtering, Thin Solid films, 156: 53, (1988)Google Scholar
3. Sundgern, J.E., Johansson, B.O., Karlssoo, S. E. and Hentzell, H. T. G., Mechanisms of reactive sputtering of titanium nitride and titanium carbide, Thin Solid Films. 105: 367, (1983)Google Scholar
4. Hultman, L., Hentzell, H. T. G., Sundgren, J.E., Johansson, B. O. and U., Helmersson, Initial growth of TiN on different phases of high speed steel, ThinSolid Film. 124: 163, (1985).Google Scholar
5. Valvoda, V., Kuzel, R. JR., Cerny, R., Dobiasova, L.,Musil, J. and Poulex, V., X-ray diffraction study of TiN coatings at different substrate temperatures, Cryst. Res. Technol. 23: 1483, (1988)Google Scholar
6. Manory, R.R. and G., Kimmel, X-ray characterization of TiN(x) films with CaF2-type structure, Thin Solid Films. 150: 277, (1987)Google Scholar
7. Hajdov, H. and Cermak, M., a New X-ray diffraction method for thin film thickness Estimation, Phys. Stat. Sol. 72: 195, (1982)Google Scholar
8. Brandt, C. G. and van dor Vliet, G.H., Quantitative analysis of thin samples by X-ray diffraction, Adv. X-ray Anal. 29: 203, (1985)Google Scholar
9. Schreiner, W.N. and Kimmel, G., Observed and calculated XRPD intensities for single substance sample, Adv. X-ray Anal. 30: 351, (1987)Google Scholar
10. Kimmel, G., Shafirstien, G. and Bamberger, M., Fast thickness measurement of thin crystalline layers by XRPD methods, Adv. X-ray Anal. 32: 293, (1989)Google Scholar
11. Willis, J.E., Characterization of thin films using XRF, Adv. X-ray Anal. 33: 189, (1990),Google Scholar
12. Kataoka, Y. and Arai, T., Basis studies of multi-layer thin films analysis using fundamental parameter method, Adv. X-ray Anal. 33: 213, (1990)Google Scholar
13. Kataoka, Y. and Arai, T., Application of multi-layer thin films analysis by X-Ray spectrometry using fundamental parameter method, Adv. X-ray Anal. 33: 213, (1990)Google Scholar
14. D.K.G., de Boer and Brouwer, P.N., Fundamental parameter-based X-ray fluorcccnce analysis of thin and multilayer samples, Adv. X-ray Anal. 33: 237, (1990)Google Scholar
15. Kimmel, G., High quality of X-Ray diffraction data using an ADS and thin samples, Powder Diffraction. 2: 22, (1987)Google Scholar