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An Order of Magnitude Improvement in Detection Limits Achieved by Using a New Sample Support in Small Spot Xrf Analysis.

Published online by Cambridge University Press:  06 March 2019

Andrew J. Nielson ,
D. Clark Turner ,
Alisa Wilson ,
David C. Wherry  and
Rich Wong
Andrew J. Nielson
Affiliation:
MOXTEK, Inc. Orem, Utah USA 84057
D. Clark Turner
Affiliation:
MOXTEK, Inc. Orem, Utah USA 84057
Alisa Wilson
Affiliation:
MOXTEK, Inc. Orem, Utah USA 84057
David C. Wherry
Affiliation:
Fisons Instruments San Carlos, CA USA 94070
Rich Wong
Affiliation:
Fisons Instruments San Carlos, CA USA 94070
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Abstract

A new sample support film for small spot XRF analysis has been developed that improves detection limits by a factor of 10 over traditional polymer supports. The surface characteristics of this new film are excellent for retaining drops of sample solution in one place and allowing the solution to dry into a single spot A dimpling technique was developed to further aid in concentrating the evaporated samples to the prescribed spot size and position. The film showed good resistance to chemical attacfc from the solution, even some strong acids and bases. The detection limits achieved using micro sample XRF with the ultra thin sample support were sufficient to be a comparable alternative to ICP-MS and GFAAS for elemental analysis.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 799 - 804
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

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