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An Advanced Technique for High Temperature X-Ray Elastic Constant and Stress Investigations

Published online by Cambridge University Press:  06 March 2019

Chun Liu
Affiliation:
LM3, CNRS URA 1219, ENSAM, 151 Bd de l'Hôpital 75013 Paris, France
Jean-Lou Lebrun
Affiliation:
LM3, CNRS URA 1219, ENSAM, 151 Bd de l'Hôpital 75013 Paris, France
François Sibieude
Affiliation:
ISGMP, CNRS, B. P. 5, Odeillo, 66120 Font-Romeu, France
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Abstract

A high temperature in situ X-Tay diffraction (HTXRD) instrument was devised for residual stress (RS) and X-ray elastic constant (XECs) investigations. The aim was to gain a better understanding of the stresses developed during high temperature oxidation, which is essential for the lifetime improvement of refractory alloys. The investigators use sin2ψ method to survey the stress evolution during oxidation in both the scale and the substrate, and differential method to determine the XECs that relate the measured/measurable deformation to the stress state of the materials studied. The stresses on the Ni/NiO system are measured in situ. The XECs are determined on XC75 steel samples. This paper presents the theories of stresses and XECs determined by HTXRD and briefly discusses the experimental results.

Type
VIII. High-Temperature and Non-Ambient Applications of XRD
Copyright
Copyright © International Centre for Diffraction Data 1992

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