Hostname: page-component-7bb8b95d7b-wpx69 Total loading time: 0 Render date: 2024-09-12T07:11:29.687Z Has data issue: false hasContentIssue false
  • English
  • Français

A Novel Dumond Monochromator for High-Resolution X-ray Diffraction

Published online by Cambridge University Press:  06 March 2019

N. Loxley ,
B. K. Tanner  and
D. K. Bowen
N. Loxley
Affiliation:
Bede Scientific Instruments, Lindsey ParkBowburnDurham DH6 5PF, U.K.
B. K. Tanner
Affiliation:
Bede Scientific Instruments, Lindsey ParkBowburnDurham DH6 5PF, U.K. Also Department of Physics, University of Durham, South Road, Durham DH1 3LE, U.K.
D. K. Bowen
Affiliation:
Bede Scientific Instruments, Lindsey ParkBowburnDurham DH6 5PF, U.K. Also Department of Engineering, University of Warwick, CoventryCV4 7AL, U.K.
Get access

Abstract

We discuss the optical principles behind a novel, duMond configuration, beam conditioning monochromator for high resolution X-ray diffraction. The device is capable of being switched extremely rapidly between high intensity and high resolution settings by lateral translation of the elements. It comprises two blocks of silicon each containing two beam channels oriented parallel to and at 17.65° to the (Oil) planes. In the high intensity mode, with the beam making two asymmetric reflections in each block, the angular divergence and dispersion are comparable to that from a symmetric Ge 022 device. The high resolution setting, where the beam makes four symmetric reflections, while comparable in divergence and dispersion with the 044 Ge device, exploits both σ and π polarisations. We report on the performance of the device and show how this compares with predictions using the dynamical theory of diffraction.

Type
IV. New Developments in X-Ray Sources, Instrumentation and Techniques
Information
Advances in X-Ray Analysis , Volume 38: Forty-third Annual Conference on Applications of X-ray Analysis , 1994 , pp. 361 - 369
Copyright
Copyright © International Centre for Diffraction Data 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Hart, M., (1980), in: Characterization of Crystal Growth Defects by X-ray Methods (eds). Tanner, B. K. and Bowen, D. K., Plenum Press, New York) pp. 421.Google Scholar
2. Petroff, J. F., Sauvage, M., Riglet, P. and Hashizume, H., Phil. Mag. A42 (1980) 319.Google Scholar
3. Tanner, B. K., (1990) Adv. X-ray Analysis 33 1.Google Scholar
4. Bartels, W. J., (1983) J. Vacuum Sci. Tech. B1 338.Google Scholar
5. duMond, J. W., (1937) Phys. Rev. 52 872.Google Scholar
6. Beaumont, J. H. and Hart, M. (1978), J. Phys. E (Sci. Inst.) 7 823.Google Scholar
7. Bowen, D. K. and Davies, S. T., (1983), Nucl. Inst. Meth 208 725.Google Scholar
8. Loxley, N., Tanner, B. K. and Bowen, D. K., submitted to J. Appl. Cryst.Google Scholar
9. Hart, M., (1980), in: Characterization of Crystal Growth Defects by X-ray Methods (eds). Tanner, B. K. and Bowen, D. K., Plenum Press, New York) pp. 216.Google Scholar
10. James, R. W., (1948), The optical principles of the diffraction of X-rays, Bell, London.Google Scholar
11. Bouse, U., and Hart, M., (1965) Appl. Phys. Lett. 7 238.Google Scholar