Hostname: page-component-7479d7b7d-pfhbr Total loading time: 0 Render date: 2024-07-11T05:30:26.788Z Has data issue: false hasContentIssue false
  • English
  • Français

A Minicomputer and Methodology for X-Ray Analysis

Published online by Cambridge University Press:  06 March 2019

W. Parrish ,
G. L. Ayers  and
T. C. Huang
W. Parrish
Affiliation:
IBM Research Laboratory, 5600 Cottle Road, San Jose, California 95193
G. L. Ayers
Affiliation:
IBM Research Laboratory, 5600 Cottle Road, San Jose, California 95193
T. C. Huang
Affiliation:
IBM Research Laboratory, 5600 Cottle Road, San Jose, California 95193
Get access

Abstract

This paper outlines the use of an IBM Series/1 small computer for instrument automation and data reduction for X-ray polycrystalline diffractometry and wavelength dispersive X-ray fluorescence spectrometry. The profile fitting method is used to determine 2θ, d and relative peak and integrated intensities in diffraction, and the fundamental parameters method (LAMA program) is used for quantitative analysis of bulk and thin film samples. The methods are precise and rapid.

Type
Use of Computers in Powder Diffraction
Information
Advances in X-Ray Analysis , Volume 23: Twenty-Eighth Annual Conference on Applications of X-ray Analysis, July 30 - August 3, 1979 , 1979 , pp. 313 - 316
Copyright
Copyright © International Centre for Diffraction Data 1979

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Parrish, W., Huang, T. C. and Ayers, G. L., “Profile Fitting: A Powerful Method of Computer X-Ray Instrumentation and Analysis,” Trans. Am. Cryst. Assoc. 12, 55-73 (1976).Google Scholar
2. Huang, T. C. and Parrish, W., “Qualitative Analysis of Complicated Mixtures by Profile Fitting X-Ray Diffractometer Patterns,” in Barrett, C. S., Leyden, D. E., Newkirk, J. B. and Ruud, C. O., Editors, Advances in X-Ray Analysis, Vol. 21, p. 275–288 (1978).Google Scholar
3. Parrish, W. and Huang, T. C., “Accuracy of the Profile Fitting Method for X-Ray Polycrystalline Diffractometry Proc. Symp. on Accuracy in Powder Diffraction, Nat. Bur. Standards, Washington, (1979).Google Scholar
4. Ayers, G. L., Huang, T. C. and Parrish, W., “High-Speed X-Ray Analysis,” J. Appl. Cryst. 11, 229–233 (1978).Google Scholar
5. Laguitton, D. and Mantler, M., “LAMA I - A General Fortran Program for Quantitative X-Ray Fluorescence Analysis,” in McMurdie, H. F., Barrett, C. S., Newkirk, J. B. and Ruud, C. O., Editors, Advances in X-Ray Analysis, Vol. 20, p. 515–528 (1977).Google Scholar
6. Laguitton, D. and Parrish, W., “Simultaneous Determination of Composition and Mass-Thickness of Thin Films by Quantitative X-Ray Fluoresnce Analysis,” Anal. Chem. 49, 1152-1156 (1977).Google Scholar