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Indentation-induced delamination of plasma-enhanced chemical vapor deposition silicon nitride film on gallium arsenide substrate
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- Journal:
- Journal of Materials Research / Volume 28 / Issue 8 / 28 April 2013
- Published online by Cambridge University Press:
- 27 March 2013, pp. 1047-1055
- Print publication:
- 28 April 2013
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- Article
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