4 results
In-situ Metrology for End Point Detection during Chemical Mechanical Polishing of Shallow Trench Isolation Structure
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W8.4
- Print publication:
- 2005
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Optimization of Psiloquest's Application Specific CMP Pads for Commercialization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W3.3
- Print publication:
- 2005
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Investigation of Mechanical Integrity and its effect on Polishing for Novel Polyurethane Polishing Pad
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- Journal:
- MRS Online Proceedings Library Archive / Volume 816 / 2004
- Published online by Cambridge University Press:
- 15 March 2011, K4.7
- Print publication:
- 2004
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Metrology of Psiloquest's Application Specific Pads (ASP) for CMP Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 816 / 2004
- Published online by Cambridge University Press:
- 15 March 2011, K5.6
- Print publication:
- 2004
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- Article
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