10 results
Nitrogen Profile Engineering in Thin Gate Oxides
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- Journal:
- MRS Online Proceedings Library Archive / Volume 525 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 181
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- 1998
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Nitric Oxide Rapid Thermal Nitridation of Thin Gate Oxides
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- Journal:
- MRS Online Proceedings Library Archive / Volume 470 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 381
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- 1997
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Integrated Processing of Silicon Oxynitride Alloy Dielectrics by Plasma-Assisted Oxidation, Chemical Vapor Deposition, and On-Line Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 387 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 213
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- 1995
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Silicon Oxynitride and Oxide-Nitride-Oxide Gate Dielectrics by Combined Plasma-Rapid Thermal Processing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 342 / 1994
- Published online by Cambridge University Press:
- 22 February 2011, 169
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- 1994
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A Dual-Function Uhv-Compatible Chamber for i) Low-Temperature Plasma-Assisted Oxidation, and ii) High-Temperature Rapid Thermal Processing of Si-Based Dielectric Gate Heterostructures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 303 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 339
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- 1993
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Studies of SiH2Ci2/H2 Gas Phase Chemistry for Selective Thin Film Growth of Crystalline Silicon, c-Si, Using Remote Plasma Enhanced Chemical Vapor Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 220 / 1991
- Published online by Cambridge University Press:
- 22 February 2011, 601
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- 1991
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High-Resolution Transmission Electron Microscopy: An Essential Characterization Technique for Optimization of Semiconductor Epitaxy and Interfaces
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- Journal:
- MRS Online Proceedings Library Archive / Volume 139 / 1989
- Published online by Cambridge University Press:
- 21 February 2011, 345
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- 1989
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Microstructural and Optical Characterization of GaN Films Grown by PECVD on (0001) Sapphire Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 162 / 1989
- Published online by Cambridge University Press:
- 26 February 2011, 531
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- 1989
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Development of Remote Plasma Enhanced Ohemical Vapor Deposition Processes Through the use of in Vacuo Electron Diffraction and Electron Spectroscopy
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- Journal:
- MRS Online Proceedings Library Archive / Volume 165 / 1989
- Published online by Cambridge University Press:
- 21 February 2011, 151
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- 1989
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In-Situ Surface Cleaning of Ge(111) and Si(100) for Epitaxial Growth of Ge AT 300°C Using Remote Plasma Enhanced Chemical Vapor Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 102 / 1987
- Published online by Cambridge University Press:
- 26 February 2011, 319
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- 1987
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