We successfully observed electron emission from hydrogenated diamond (111) p+-i-n+ junction diodes. Here, p+- and n+-layers mean that the boron and phosphorous impurity concentrations in these layers are around 1020 cm-3. Then the p+-layer on top of the diode suppresses electron emission from the top-surface area. The heavily doped layers also play an important role to obtain high diode and emission currents. The emission started when the applying bias voltage was equal to the built-in potential, and the emission current reached to over 1 μA at room temperature operation. With taking into account our previous photoemission yield spectroscopy results and with the very high binding energy of free excitons of 80 meV in diamond, we suggested that the electron emission was derived from free excitons generated in the i-layer of the diodes.

We investigated the optical, electrical and structural properties of the layer which was implanted with sulfur ion(S+) in 4H-SiC. By using the high temperature ion implantation technique more less residual defects were observed compared with the room temperature ion implantation by Rutherford backscattering spectrometry and channeling(RBS-channeling). After annealing at 1700°C there was no significant difference between the implanted sample and virgin sample in crystallinity within the detection limit of RBS-channeling. From the result of low temperature photoluminescence(LTPL) we could see the photoluminescences, so-called D1 and D2center, originating in the defects formed by ion implantation and post-annealing(∼1700°C) processes and confirmed that their intensities decreased with the increasing of the total dose of S+. The result of Hall effect measurement suggested that the conduction type of S+-implanted layer is n-type and their activation energies were 275meV and 410meV by the fitting of neutrality equation assuming the two activation energies for the hexagonal and cubic lattice sites in 4H-SiC.