3 results
Chemical Stability of Reactively Sputtered AlN with Plasma Enhanced Chemical Vapor Deposited SiO2 and SiNx
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 343 / 1994
- Published online by Cambridge University Press:
- 15 February 2011, 253
- Print publication:
- 1994
-
- Article
- Export citation
Characterization of Sputtered Ge Film
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 343 / 1994
- Published online by Cambridge University Press:
- 15 February 2011, 715
- Print publication:
- 1994
-
- Article
- Export citation
Improvement in the Activation Efficiency of Implanted Si in GaAs using Oxygen Plasma Pretreatment
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 259 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 311
- Print publication:
- 1992
-
- Article
- Export citation